SCHEMBL64707

SCHEMBL64707

C=C(C)C(=O)Oc1ccc(C(C)(C)c2ccc(OC(=O)C(=C)C)c(OCC)c2OCC)c(OCC)c1OCC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.35
CYP2C19 P33261 2/20 0.35
CYP2C9 P11712 1/20 0.35
ALDH1A1 P00352 3/20 0.34
HPGD P15428 2/20 0.34
HSD17B10 Q99714 2/20 0.34
KDM4E B2RXH2 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
KMT2A Q03164 3/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MEN1 O00255 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
MAPK1 P28482 1/20 0.33
ELANE P08246 1/20 0.33
CREBBP Q92793 1/20 0.33
TDP1 Q9NUW8 4/20 0.33
TSHR P16473 2/20 0.33
ATM Q13315 2/20 0.32
THRB P10828 1/20 0.32
RORC P51449 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29415623 1.00 CYP1A2 (0.35) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
Methacrylic Acid SCHEMBL2236061 0.96 ALDH1A1 (0.34) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
Methacrylic Acid SCHEMBL5604507 0.96 ALDH1A1 (0.34) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
SCHEMBL6479131 0.94 CYP2C9 (0.32) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
SCHEMBL9065029 0.92 ALDH1A1 (0.38) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
SCHEMBL6295108 0.91 CYP1A2 (0.32) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
SCHEMBL11214664 0.90 VDR (0.31) CYP1A2CYP2C19CYP2C9TSHR
SCHEMBL29771136 0.90 TSHR (0.35) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
SCHEMBL66400 0.90 TSHR (0.35) CYP1A2CYP2C19CYP2C9ALDH1A1HPGD
SCHEMBL30384943 0.89 CA9 (0.33) ALDH1A1HSD17B10KMT2ASMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2034 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11992538-B2 Polymerizable dental composition based on condensed silanes VOCO GMBH (DE) 2024-05-28 US claimed
US-20240108555-A1 UNREACTIVE TRANSFER SPLINTS VOCO GMBH (DE) 2024-04-04 US claimed
EP-3482740-B1 DENTAL PHOTOPOLYMERIZABLE COMPOSITION G C DENTAL IND CORP (JP) 2024-03-27 EP claimed
EP-4338702-A1 NON-REACTIVE TRANSFER RAILS VOCO GmbH (DE) 2024-03-20 EP claimed
US-11926688-B2 Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC (US) 2024-03-12 US claimed
US-20240026127-A1 COMPOSITE PARTICLE AND USE THEREOF IN OPTICAL FILTRATION COLOURSMITH LABS INC. (CA) 2024-01-25 US claimed
EP-4306099-A1 METHOD FOR PRODUCING DENTAL MILL BLANKS VOCO GmbH (DE) 2024-01-17 EP claimed
US-20240008963-A1 PROCESS FOR THE PRODUCTION OF DENTAL MILLING BLANKS VOCO GMBH (DE) 2024-01-11 US claimed
EP-4255983-A1 COMPOSITE PARTICLE AND USE THEREOF IN OPTICAL FILTRATION Coloursmith Labs Inc. (CA) 2023-10-11 EP claimed
US-20230091200-A1 DENTAL GRADIENT COLOR-RESIN CERAMIC RESTORATION MATERIAL AND PREPARATION METHOD THEREOF AIDITE (QINHUANGDAO) TECHNOLOGY CO., LTD. (CN) 2023-03-23 US claimed
US-5183870-A A curable polybutylene glycol di(meth)acrylate, a urethane or epoxy (meth)acrylate and a (meth)acrylate; heat and water resistance; impact strength; dyeability; workability MITSUBISHI RAYON CO., LTD (JP) 1993-02-02 US claimed
EP-0441383-A2 Use of a copolymer for the making of contact lenses MITSUBISHI RAYON CO., LTD. (JP) 1991-08-14 EP claimed
US-4985472-A ACRYLATED POLYISOCYANATE MITSUBISHI RAYON COMPANY, LTD. (JP) 1991-01-15 US claimed
US-4898899-A Adhesive composition TOAGOSEI CHEMICAL INDUSTRY CO. (JP) 1990-02-06 US claimed
US-4647638-A Novel organophosphate and adhesive comprising it NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1987-03-03 US claimed
EP-0035574-B1 PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL ARAI, Tokuji (JP) 1985-02-06 EP claimed
EP-0012948-B1 SCRATCH-RESISTANT, DYEABLE COATING COMPOSITIONS FOR SYNTHETIC RESIN ARTICLES MITSUBISHI RAYON CO., LTD. (JP) 1983-02-02 EP claimed
US-4370403-A BENZIL AND /DIMETHYLAMINO/BENZALDEHYDE PHOTOINITIATORS Arai, Tokuji (JP) 1983-01-25 US claimed
US-4291097-A PHOTOPOLYMERIZATION OF AN ACRYLIC ESTER MIXTURE WITH PHOSPHORIC ACID ESTER AND AN ETHANOLAMINE MITSUBISHI RAYON CO., LTD. (JP) 1981-09-22 US claimed
EP-0035574-A1 PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL ARAI, Tokuji (JP) 1981-09-16 EP claimed