SCHEMBL6472847

SCHEMBL6472847

CCCCOC=C(C(=O)Oc1c(OCCCC)c(OCCCC)c(C(C)(C)c2c(OCCCC)c(OCCCC)c(OC(=O)C(=COCCCC)C(OCCCC)(OCCCC)OCCCC)c(OCCCC)c2OCCCC)c(OCCCC)c1OCCCC)C(OCCCC)(OCCCC)OCCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL393926 0.88
SCHEMBL305971 0.79
SCHEMBL11705925 0.74
SCHEMBL11706070 0.68
SCHEMBL391495 0.66 TSHR (0.36)
SCHEMBL9486472 0.64
SCHEMBL392034 0.63
SCHEMBL65415 0.61 THRB (0.36)
SCHEMBL10692851 0.59 LTA4H (0.46)
SCHEMBL5587446 0.58 LTA4H (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2005016983-A1 COATING SYSTEM CONTAINING (METH)ACRYLATE SIKA TECHNOLOGY AG (CH) 2005-02-24 WO disclosed
EP-0769038-B1 SYNTHETIC MORTAR RESIN COMPOSITIONS CRAY VALLEY SA (FR) 1998-03-04 EP disclosed
US-5300536-A Vinyl compound capable of free radical polymerization TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1994-04-05 US disclosed
US-4898899-A Adhesive composition TOAGOSEI CHEMICAL INDUSTRY CO. (JP) 1990-02-06 US disclosed
US-4055542-A PEROXIDE THREE BOND CO., LTD. (JA) 1977-10-25 US disclosed