Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.44 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | F2 | P00734 | 3/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.40 |
| ▸ | HTR6 | P50406 | 2/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
| ▸ | HTR2A | P28223 | 2/20 | 0.38 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2516868 | 0.85 | CA1 (0.50) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL38662137 | 0.82 | NR1I2 (0.39) | NLRP3HSD17B2HSD11B1NR1I2LMNA | |
| SCHEMBL453404 | 0.82 | NR1I2 (0.39) | NLRP3HSD17B2HSD11B1NR1I2LMNA | |
| SCHEMBL8007140 | 0.81 | BCL2A1 (0.37) | NLRP3HSD17B2CA1CA2F2 | |
| SCHEMBL175822 | 0.81 | HSD11B1 (0.43) | HSD17B2CA1CA2HSD11B1LMNA | |
| SCHEMBL2966140 | 0.79 | HSD11B1 (0.43) | HSD17B2CA1CA2HSD11B1ACHE | |
| SCHEMBL6746175 | 0.79 | HSD11B1 (0.52) | NLRP3HTR6HSD11B1LMNAMEN1 | |
| SCHEMBL5684924 | 0.78 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| Potassium Ion SCHEMBL10962719 | 0.78 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| Zinc Ion SCHEMBL1683962 | 0.78 | CA1 (0.61) | CA1CA2CA9F2PRSS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220283499-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-09-08 | — | — | US | disclosed |
| US-11286423-B2 | Laminate, manufacturing method of laminate, and image display device | FUJIFILM CORPORATION (JP) | 2022-03-29 | — | — | US | disclosed |
| US-20200362247-A1 | LAMINATE, MANUFACTURING METHOD OF LAMINATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2020-11-19 | — | — | US | disclosed |
| US-10078265-B2 | Pattern-forming method, resin, and composition | JSR CORPORATION (JP) | 2018-09-18 | — | — | US | disclosed |
| US-10036954-B2 | — | — | 2018-07-31 | — | — | US | disclosed |
| US-20180120706-A1 | PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-9696626-B2 | Composition for forming a resist underlayer film, and pattern-forming method | JSR CORPORATION (JP) | 2017-07-04 | — | — | US | disclosed |
| US-9581905-B2 | Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound | JSR CORPORATION (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20170003595-A1 | PATTERN-FORMING METHOD, RESIN, AND COMPOSITION | JSR CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-9447303-B2 | Composition for forming resist underlayer film | JSR CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6242161-B1 | ABSORPTION COATINGS USING COPOLYMERS | JSR CORPORATION (JP) | 2001-06-05 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10078265-B2 | Pattern-forming method, resin, and composition | RER1, SLIRP, SRSF9 | NLRP3 3464/4885HSD17B2 4006/4885CA1 898/4885 |
| US-10036954-B2 | — | SMURF1, DSG1, SLIRP | NLRP3 4625/4885HSD17B2 3288/4885CA1 617/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.