SCHEMBL647824

SCHEMBL647824

CCCCOCc1ccccc1COCCCC

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.45
TSHR P16473 6/20 0.45
ALDH1A1 P00352 4/20 0.45
CYP3A4 P08684 2/20 0.45
CYP1A2 P05177 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
TDP1 Q9NUW8 4/20 0.42
L3MBTL1 Q9Y468 3/20 0.42
NPSR1 Q6W5P4 1/20 0.42
HPGD P15428 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
NR5A1 Q13285 1/20 0.39
MAPK1 P28482 1/20 0.39
LIPG Q9Y5X9 1/20 0.38
RECQL P46063 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29618448 1.00 LTA4H (0.45) LTA4HTSHRALDH1A1CYP3A4CYP1A2
SCHEMBL4235969 0.90 TDP1 (0.42) LTA4HTSHRALDH1A1CYP3A4CYP1A2
SCHEMBL10792626 0.88 TSHR (0.44) LTA4HTSHRALDH1A1CYP3A4CYP1A2
SCHEMBL9452735 0.86 CYP1A2 (0.55) LTA4HTSHRALDH1A1CYP3A4CYP1A2
SCHEMBL19055306 0.86 IDO1 (0.50) LTA4HTSHRALDH1A1CYP3A4CYP1A2
SCHEMBL1839896 0.86 IDO1 (0.50) LTA4HTSHRALDH1A1CYP3A4TDP1
SCHEMBL14948690 0.86 IDO1 (0.50) LTA4HTSHRALDH1A1CYP3A4CYP1A2
SCHEMBL648261 0.86 L3MBTL1 (0.45) LTA4HTSHRALDH1A1L3MBTL1NPSR1
SCHEMBL7178486 0.85 LTA4H (0.40) LTA4HTSHRALDH1A1CYP3A4NPSR1
SCHEMBL18386621 0.84 GABRA1 (0.48) LTA4HTSHRALDH1A1CYP3A4CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022255321-A1 INTEGRATED DICING/DIE BONDING FILM AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 昭和電工マテリアルズ株式会社 2022-12-08 WO disclosed
WO-2022255322-A1 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND DICING-DIE BONDING INTEGRATED FILM 昭和電工マテリアルズ株式会社 2022-12-08 WO disclosed
US-20220216114-A1 METHOD FOR EVALUATING PICKUP PERFORMANCE, INTEGRATED DICING/DIE-BONDING FILM, METHOD FOR EVALUATING AND SELECTING INTEGRATED DICING/DIE-BONDING FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2022-07-07 US disclosed
US-20140332984-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE HITACHI CHEMICAL CO LTD (JP) 2014-11-13 US disclosed
US-8200059-B2 Adhesive composition for optical waveguide, adhesive film for optical waveguide and adhesive sheet for optical waveguide each using the same, and optical device using any of them HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-06-12 US disclosed
US-20120080808-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE INADA TEIICHI (JP) 2012-04-05 US disclosed
US-8119737-B2 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-02-21 US disclosed
US-8053378-B2 Modified phenolic resin, epoxy resin composition containing the same, and prepreg containing the composition MITSUI CHEMICALS, INC. (JP) 2011-11-08 US disclosed
US-20110187006-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE INADA TEIICHI 2011-08-04 US disclosed
US-7947779-B2 Semiconductor device by adhering circuit substrate with adhesive film of epoxy resin, phenolic resin and incompatible polymer HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-05-24 US disclosed
US-20070026572-A1 Dicing/die bonding sheet RESONAC CORPORATION (JP) 2007-02-01 US disclosed
US-20060106166-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2006-05-18 US disclosed
US-20060100315-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2006-05-11 US disclosed
US-20040259019-A1 Positive photosensitive composition SUMITOMO CHEMICAL COMPANY, LIMITED 2004-12-23 US disclosed
US-20030069331-A1 An adhesive formulation containing an epoxy resin, a phenolic curing agent and a acrylic copolymer incompatible with epoxy resin HITACHI CHEMICAL CO., LTD. (JP) 2003-04-10 US disclosed
US-6297332-B1 FOR SEALING A SEMICONDUCTOR INTEGRATED CIRCUIT, AMINOPHOSPHINE OXIDE AS IMPROVED ACCELERATING AGENT, PACKAGE BETTER IN CRACK RESISTANCE MITSUI CHEMICALS, INC. (JP) 2001-10-02 US disclosed
EP-0953588-A2 An epoxy-resin composition and use thereof Mitsui Chemicals, Inc. (JP) 1999-11-03 EP disclosed
EP-0233450-B1 LINEAR SALICYLIC ACID COPOLYMERS AND THEIR METAL SALTS, PRODUCTION PROCESS THEREOF, COLOR-DEVELOPING AGENTS COMPRISING METAL-RESINS OF THE COPOLYMERS, AND COLOR-DEVELOPING SHEETS EMPLOYING THE AGENTS MITSUI TOATSU CHEMICALS, Inc. (JP) 1992-03-11 EP disclosed
US-4783521-A Linear salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal-resins of the copolymers MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1988-11-08 US disclosed
EP-0233450-A2 Linear salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal-resins of the copolymers, and color-developing sheets employing the agents MITSUI TOATSU CHEMICALS, Inc. (JP) 1987-08-26 EP disclosed