SCHEMBL648261

SCHEMBL648261

CCCOCc1ccccc1COCCC

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.45
KDM4E B2RXH2 1/20 0.45
NPC1 O15118 1/20 0.45
BRD4 O60885 1/20 0.45
MITF O75030 1/20 0.45
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.38
PTPN1 P18031 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
IDO1 P14902 3/20 0.37
NR1I2 O75469 1/20 0.37
MAPT P10636 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
ADRA2A P08913 1/20 0.35
ADRA2B P18089 1/20 0.35
ADRA2C P18825 1/20 0.35
TSHR P16473 1/20 0.35
LTA4H P09960 1/20 0.34
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18573061 0.89 IDO1 (0.53) L3MBTL1KDM4ENPC1BRD4MITF
SCHEMBL10593611 0.87 TAAR1 (0.42) L3MBTL1KDM4ENPC1BRD4MITF
SCHEMBL29618448 0.86 LTA4H (0.45) L3MBTL1ALDH1A1MEN1KMT2ANPSR1
SCHEMBL647824 0.86 LTA4H (0.45) L3MBTL1ALDH1A1MEN1KMT2ANPSR1
SCHEMBL7222677 0.85 IDO1 (0.53) L3MBTL1KDM4ENPC1BRD4MITF
SCHEMBL1988193 0.85 IDO1 (0.53) L3MBTL1KDM4ENPC1BRD4MITF
SCHEMBL8662272 0.85 CYP1A2 (0.44) L3MBTL1KDM4ENPC1BRD4MITF
SCHEMBL1984467 0.85 IDO1 (0.53) L3MBTL1KDM4ENPC1BRD4MITF
SCHEMBL1840002 0.85 IDO1 (0.53) L3MBTL1KDM4ENPC1BRD4MITF
SCHEMBL6218727 0.85 L3MBTL1 (0.40) L3MBTL1KDM4ENPC1BRD4MITF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220216114-A1 METHOD FOR EVALUATING PICKUP PERFORMANCE, INTEGRATED DICING/DIE-BONDING FILM, METHOD FOR EVALUATING AND SELECTING INTEGRATED DICING/DIE-BONDING FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2022-07-07 US disclosed
US-20140332984-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE HITACHI CHEMICAL CO LTD (JP) 2014-11-13 US disclosed
US-8200059-B2 Adhesive composition for optical waveguide, adhesive film for optical waveguide and adhesive sheet for optical waveguide each using the same, and optical device using any of them HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-06-12 US disclosed
US-20120080808-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE INADA TEIICHI (JP) 2012-04-05 US disclosed
US-8119737-B2 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-02-21 US disclosed
US-8053378-B2 Modified phenolic resin, epoxy resin composition containing the same, and prepreg containing the composition MITSUI CHEMICALS, INC. (JP) 2011-11-08 US disclosed
US-20110187006-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE INADA TEIICHI 2011-08-04 US disclosed
US-7947779-B2 Semiconductor device by adhering circuit substrate with adhesive film of epoxy resin, phenolic resin and incompatible polymer HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-05-24 US disclosed
US-20110021005-A1 ADHESIVE COMPOSITION, PROCESS FOR PRODUCING THE SAME, ADHESIVE FILM USING THE SAME, SUBSTRATE FOR MOUNTING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE INADA TEIICHI 2011-01-27 US disclosed
US-20100129045-A1 Adhesive Composition for Optical Waveguide, Adhesive Film for Optical Waveguide and Adhesive Sheet for Optical Waveguide Each Using the Same, and Optical Device Using Any of Them HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-05-27 US disclosed
US-20070036971-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2007-02-15 US disclosed
US-20070026572-A1 Dicing/die bonding sheet RESONAC CORPORATION (JP) 2007-02-01 US disclosed
US-20060106166-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2006-05-18 US disclosed
US-20060100315-A1 Adhesive composition, process for producing the same, adhesive film using the same, substrate for mounting semiconductor and semiconductor device INADA TEIICHI 2006-05-11 US disclosed
US-20030069331-A1 An adhesive formulation containing an epoxy resin, a phenolic curing agent and a acrylic copolymer incompatible with epoxy resin HITACHI CHEMICAL CO., LTD. (JP) 2003-04-10 US disclosed
US-6297332-B1 FOR SEALING A SEMICONDUCTOR INTEGRATED CIRCUIT, AMINOPHOSPHINE OXIDE AS IMPROVED ACCELERATING AGENT, PACKAGE BETTER IN CRACK RESISTANCE MITSUI CHEMICALS, INC. (JP) 2001-10-02 US disclosed
EP-0953588-A2 An epoxy-resin composition and use thereof Mitsui Chemicals, Inc. (JP) 1999-11-03 EP disclosed
EP-0233450-B1 LINEAR SALICYLIC ACID COPOLYMERS AND THEIR METAL SALTS, PRODUCTION PROCESS THEREOF, COLOR-DEVELOPING AGENTS COMPRISING METAL-RESINS OF THE COPOLYMERS, AND COLOR-DEVELOPING SHEETS EMPLOYING THE AGENTS MITSUI TOATSU CHEMICALS, Inc. (JP) 1992-03-11 EP disclosed
US-4783521-A Linear salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal-resins of the copolymers MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1988-11-08 US disclosed
EP-0233450-A2 Linear salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal-resins of the copolymers, and color-developing sheets employing the agents MITSUI TOATSU CHEMICALS, Inc. (JP) 1987-08-26 EP disclosed