⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22639108 | 0.97 | CES2 (0.58) | — | |
| SCHEMBL22639088 | 0.97 | CES2 (0.58) | — | |
| SCHEMBL22639103 | 0.97 | CES2 (0.58) | — | |
| SCHEMBL65331 | 0.97 | — | — | |
| SCHEMBL3869687 | 0.93 | — | — | |
| SCHEMBL10388573 | 0.86 | NOS2 (0.37) | — | |
| SCHEMBL2317859 | 0.86 | — | — | |
| SCHEMBL9164202 | 0.75 | CES2 (0.63) | — | |
| SCHEMBL217137 | 0.73 | — | — | |
| SCHEMBL64016 | 0.73 | EPHX1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 840 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190330192-A1 | SUBSTITUTED AZOLYLPYRROLONES AND AZOLYLHYDANTOINS AND SALTS THEREOF AND USE THEREOF AS HERBICIDAL ACTIVE SUBSTANCES | BAYER AKTIENGESELLSCHAFT (DE) | 2019-10-31 | — | — | US | claimed |
| EP-3558976-A1 | SUBSTITUTED AZOLYLPYRROLONES AND AZOLYLHYDANTOINES AND SALTS THEREOF AND USE THEREOF AS HERBICIDAL ACTIVE SUBSTANCES | Bayer CropScience Aktiengesellschaft (DE) | 2019-10-30 | — | — | EP | claimed |
| CN-110392680-A | Substituted azolyl pyrrolidones and azolyl hydantoins and salts thereof and their use as herbicidal active substances | 拜耳作物科学股份公司 | 2019-10-29 | — | — | CN | claimed |
| WO-2018114663-A1 | SUBSTITUTED AZOLYLPYRROLONES AND AZOLYLHYDANTOINES AND SALTS THEREOF AND USE THEREOF AS HERBICIDAL ACTIVE SUBSTANCES | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2018-06-28 | — | — | WO | claimed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| CN-101304982-A | Process for the preparation of benzotriazepine derivatives | JANSSEN PHARMACEUTICA NV (BE) | 2008-11-12 | — | — | CN | claimed |
| EP-1948624-A2 | PROCESS FOR THE PREPARATION OF BENZO[E][1,2,4]TRIAZEPIN-2-ONE DERIVATIVES | Janssen Pharmaceutica, N.V. (BE) | 2008-07-30 | — | — | EP | claimed |
| WO-2007035430-A2 | PROCESS FOR THE PREPARATION OF BENZO [E] [1,2,4] TRIAZEPIN-2-ONE DERIVATIVES | JANSSEN PHARMACEUTICA N.V. (BE) | 2007-03-29 | — | — | WO | claimed |
| US-20070066819-A1 | PROCESS FOR THE PREPARATION OF BENZOTRIAZEPINE DERIVATIVES | JANSSEN PHARMACUETICA N.V., (BE) | 2007-03-22 | — | — | US | claimed |
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | claimed |
| US-20240210822-A1 | SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-06-27 | — | — | US | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-12001138-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| US-5972560-A | A CROSSLINKED POLYSILOXANE PHOTOACID GENERATOR HAVING HIGH TRANSPARENCY, HIGH RESOLUTION, IMPROVED LATITUDE OF EXPOSURE, PROCESS ADAPTABILITY, AND FOR PRECISE MICRO-PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| CN-1202157-A | Pyridazin-3-one derivatives, their use, and intermediates for their preparation | SUMITOMO CHEMICAL CO (JP) | 1998-12-16 | — | — | CN | disclosed |
| EP-0850227-A1 | PYRIDAZIN-3-ONE DERIVATIVES, THEIR USE, AND INTERMEDIATES FOR THEIR PRODUCTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-07-01 | — | — | EP | disclosed |
| WO-1997007104-A1 | PYRIDAZIN-3-ONE DERIVATIVES, THEIR USE, AND INTERMEDIATES FOR THEIR PRODUCTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-02-27 | — | — | WO | disclosed |