Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 1/20 | 0.43 |
| ▸ | PARL | Q9H300 | 2/20 | 0.39 |
| ▸ | FAAH | O00519 | 4/20 | 0.38 |
| ▸ | MGLL | Q99685 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL64128 | 1.00 | PRKCA (0.43) | PRKCAPARLFAAHMGLLCA2 | |
| SCHEMBL7716556 | 1.00 | PRKCA (0.43) | PRKCAPARLFAAHMGLLCA2 | |
| SCHEMBL64006 | 0.98 | PRKCA (0.40) | PRKCAPARLFAAHMGLLKMT2A | |
| SCHEMBL2677308 | 0.93 | PARL (0.41) | PRKCAPARLFAAHMGLLKMT2A | |
| SCHEMBL65689 | 0.85 | PARL (0.43) | PARLFAAHMGLLPOLB | |
| SCHEMBL4829790 | 0.79 | FAAH (0.38) | PRKCAFAAHCA2 | |
| SCHEMBL4837295 | 0.79 | FAAH (0.38) | PRKCAFAAHCA2 | |
| SCHEMBL64833 | 0.79 | PARL (0.47) | PARLFAAHMGLLCA2SMN1; SMN2 | |
| SCHEMBL4831801 | 0.79 | PRKCA (0.37) | PRKCAFAAHCA2 | |
| SCHEMBL4836635 | 0.79 | PRKCA (0.37) | PRKCAFAAHCA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | claimed |
| US-7759045-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-20 | — | — | US | disclosed |
| US-20090004601-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-01-01 | — | — | US | disclosed |
| EP-0875787-B1 | Method for reducing the substrate dependence of resist | WAKO PURE CHEM IND LTD (JP) | 2005-12-14 | — | — | EP | disclosed |
| US-6893794-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-05-17 | — | — | US | disclosed |
| US-6709799-B2 | Resist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-03-23 | — | — | US | disclosed |
| US-20040018445-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-01-29 | — | — | US | disclosed |
| US-6645693-B2 | Radiation sensitivity | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-11-11 | — | — | US | disclosed |
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | disclosed |
| US-20020155376-A1 | Mixture of radiation sensive compound and binder; fluoropolymers | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |
| US-6383709-B2 | IMPROVED PROFILE, SENSITIVITY, RESOLUTION; ALKALI-SOLUBLE NOVOLAK RESIN, QUINONEDIAZIDE COMPOUND AND N-(N-OCTYLSULFONYLOXY-)SUCCINIMIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | disclosed |
| US-20020031718-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-03-14 | — | — | US | disclosed |
| US-20010051313-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-12-13 | — | — | US | disclosed |
| US-6303264-B1 | PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2001-10-16 | — | — | US | disclosed |
| US-20010018161-A1 | Photosensitive resin for photolithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-30 | — | — | US | disclosed |
| US-6068962-A | NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-30 | — | — | US | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0831371-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-25 | — | — | EP | disclosed |