Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27545799 | 0.87 | ALDH1A1 (0.35) | ALDH1A1TSHRTHRB | |
| SCHEMBL10456434 | 0.85 | TSHR (0.34) | ALDH1A1TSHRTHRB | |
| SCHEMBL27753214 | 0.85 | THRB (0.36) | ALDH1A1TSHRTHRB | |
| SCHEMBL3990899 | 0.82 | TSHR (0.37) | ALDH1A1TSHRTHRB | |
| SCHEMBL4596290 | 0.82 | TSHR (0.37) | ALDH1A1TSHRTHRB | |
| SCHEMBL27648690 | 0.82 | THRB (0.34) | ALDH1A1TSHRTHRB | |
| SCHEMBL601418 | 0.81 | TSHR (0.45) | ALDH1A1TSHRTHRB | |
| SCHEMBL8864054 | 0.81 | TSHR (0.36) | ALDH1A1TSHRTHRB | |
| SCHEMBL554126 | 0.80 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRB | |
| SCHEMBL5068871 | 0.79 | TSHR (0.43) | ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104610878-B | A kind of photo-crosslinking glass frost flower coating and preparation method thereof | 邯郸学院 | 2017-06-30 | — | — | CN | claimed |
| WO-2016189141-A1 | METHOD FOR THE DETERMINATION OF TARGETS OF BIOTINYLATED MOLECULES | UNIVERSITAT AUTONOMA DE BARCELONA (ES) | 2016-12-01 | — | — | WO | claimed |
| WO-1984003240-A1 | COMPOUND FILM CONTAINING OLEFIN | NESTE OY (FI) | 1984-08-30 | — | — | WO | claimed |
| CN-114326310-B | Core-shell compound, photosensitive resin composition, photosensitive resin layer, color filter and CMOS image sensor | 三星SDI株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-120019093-A | Curable composition, cured layer manufactured using the composition, color filter including the cured layer, and display device including the color filter | 三星SDI株式会社 | 2025-05-16 | — | — | CN | disclosed |
| EP-2718629-B1 | DISPLAY DEVICE | SCHOTT AG (DE) | 2025-04-02 | — | — | EP | disclosed |
| CN-115637058-B | Core-shell compound, resin composition, layer thereof, color filter and display device | 三星SDI株式会社 | 2024-10-11 | — | — | CN | disclosed |
| CN-116264835-B | Curable composition, cured layer prepared from the same, and color filter comprising the same | 三星SDI株式会社 | 2024-08-27 | — | — | CN | disclosed |
| CN-115572492-B | Core-shell compound, photosensitive resin composition, photosensitive resin layer, color filter and CMOS image sensor | 三星SDI株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-117991588-A | Photosensitive resin composition, photosensitive resin layer using same, color filter, and display device | 三星SDI株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117706872-A | Photosensitive resin composition, photosensitive resin layer using the same, color filter, and CMOS image sensor | 三星SDI株式会社 | 2024-03-15 | — | — | CN | disclosed |
| US-20140138135-A1 | SILICON/GERMANIUM PARTICLE INKS, DOPED PARTICLES, PRINTING AND PROCESSES FOR SEMICONDUCTOR APPLICATIONS | NANOGRAM CORPORATION (US) | 2014-05-22 | — | — | US | disclosed |
| US-8632702-B2 | Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications | NANOGRAM CORPORATION (US) | 2014-01-21 | — | — | US | disclosed |
| US-20130183487-A1 | GLASS OR GLASS-CERAMIC COMPOSITE MATERIAL AND METHOD FOR PRODUCING SAME | SCHOTT AG (DE) | 2013-07-18 | — | — | US | disclosed |
| US-8119233-B2 | Inorganic particles within an organic matrix; controlling particle sizes; particles can be surface treated; matrix is semiconductor polymer | NANOGRAM CORPORATION (US) | 2012-02-21 | — | — | US | disclosed |
| EP-2109643-A1 | NANOPARTICLE INKS BASED ON SILICON/GERMANIUM, DOPED PARTICLES, PRINTING AND PROCESSES FOR SEMICONDUCTOR APPLICATIONS | Nanogram Corporation (US) | 2009-10-21 | — | — | EP | disclosed |
| WO-2008100568-A1 | FUNCTIONAL COMPOSITES, FUNCTIONAL INKS AND APPLICATIONS THEREOF | NANOGRAM CORPORATION (US) | 2008-08-21 | — | — | WO | disclosed |
| US-20080199687-A1 | Functional composites, functional inks and applications thereof | NANOGRAM CORPORATION | 2008-08-21 | — | — | US | disclosed |
| WO-2008085806-A1 | NANOPARTICLE INKS BASED ON SILICON/GERMANIUM, DOPED PARTICLES, PRINTING AND PROCESSES FOR SEMICONDUCTOR APPLICATIONS | NANOGRAM CORPORATION (US) | 2008-07-17 | — | — | WO | disclosed |
| US-20080160265-A1 | Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications | NANOGRAM CORPORATION | 2008-07-03 | — | — | US | disclosed |