SCHEMBL6514136

SCHEMBL6514136

C=C[SiH2]OC(Cc1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 4/20 0.37
SLC6A4 P31645 3/20 0.37
SLC6A3 Q01959 3/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
EPHX1 P07099 3/20 0.35
ANPEP P15144 1/20 0.35
TAAR1 Q96RJ0 3/20 0.35
SIGMAR1 Q99720 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
ACP3 P15309 1/20 0.35
MAOA P21397 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
TSHR P16473 1/20 0.33
CYP2C19 P33261 1/20 0.33
CYP2A6 P11509 1/20 0.33
ADORA2A P29274 1/20 0.33
ADORA1 P30542 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28883494 0.80 EPHX1 (0.37) SLC6A2SLC6A4SLC6A3EPHX1ANPEP
SCHEMBL704840 0.77 SLC6A2 (0.40) SLC6A2SLC6A4SLC6A3EPHX1ANPEP
SCHEMBL3894504 0.77 EPHX1 (0.43) SLC6A2SLC6A4SLC6A3EPHX1ANPEP
SCHEMBL705910 0.77 SLC6A2 (0.40) SLC6A2SLC6A4SLC6A3EPHX1ANPEP
SCHEMBL703380 0.77 SLC6A2 (0.40) SLC6A2SLC6A4SLC6A3EPHX1ANPEP
SCHEMBL4171307 0.77 SIGMAR1 (0.42) SLC6A2SLC6A4SLC6A3EPHX1ANPEP
SCHEMBL9499341 0.77 SLC6A2 (0.40) SLC6A2SLC6A4SLC6A3SMN1; SMN2EPHX1
SCHEMBL8641141 0.76 EPHX1 (0.42) SLC6A2SLC6A4SLC6A3SMN1; SMN2EPHX1
SCHEMBL703254 0.74 SLC6A2 (0.38) SLC6A2SLC6A4SLC6A3EPHX1ANPEP
SCHEMBL704181 0.74 SLC6A2 (0.38) SLC6A2SLC6A4SLC6A3EPHX1ANPEP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110734552-B Preparation method of high-purity silicon carbide polycrystalline powder source precursor 哈尔滨工业大学 2021-12-14 CN disclosed
CN-110627974-A High-heat-resistance phosphorus-silicon flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2019-12-31 CN disclosed
US-20050124747-A1 Coating composition for ink-jet recording medium and ink-jet recording medium DEUTSCHE BANK AG, NEW YORK BRANCH, AS COLLATERAL AGENT 2005-06-09 US disclosed
EP-1470928-A1 COATING COMPOSITION FOR INK-JET RECORDING MEDIUM AND INK-JET RECORDING MEDIUM Clariant International Ltd. (CH) 2004-10-27 EP disclosed
US-5433745-A Hydrogel and hydrophilic polymer ALLERGAN, INC. (US) 1995-07-18 US disclosed