SCHEMBL6532147

SCHEMBL6532147

O=Cc1cc(OCCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)c(OCCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)c(OCCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FDPS P14324 1/20 0.37
APP P05067 1/20 0.33
MAPT P10636 7/20 0.32
SMN1; SMN2 Q16637 5/20 0.32
LMNA P02545 3/20 0.32
NPSR1 Q6W5P4 2/20 0.32
HTT P42858 2/20 0.32
ALDH1A1 P00352 8/20 0.31
HPGD P15428 5/20 0.31
MAPK1 P28482 2/20 0.31
L3MBTL1 Q9Y468 2/20 0.31
MEN1 O00255 1/20 0.31
POLB P06746 1/20 0.31
ALOX12 P18054 1/20 0.31
RECQL P46063 1/20 0.31
KMT2A Q03164 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CYP2C9 P11712 2/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6516266 0.79 ALOX15 (0.30)
SCHEMBL3480978 0.79 ALOX15 (0.30)
SCHEMBL3480760 0.77 TSHR (0.37) MAPTLMNAHPGDL3MBTL1MEN1
SCHEMBL896329 0.77 ALDH1A1 (0.48) MAPTSMN1; SMN2LMNAALDH1A1HPGD
SCHEMBL6508979 0.76 FDPS (0.63) FDPSMAPTSMN1; SMN2LMNANPSR1
SCHEMBL3046890 0.76 PLA2G2D (0.37) L3MBTL1POLBTDP1
SCHEMBL2020660 0.73 ALDH1A1 (0.47) MAPTSMN1; SMN2LMNAALDH1A1HPGD
SCHEMBL11967109 0.73 PLA2G2D (0.39) ALDH1A1HPGD
SCHEMBL20816223 0.73 PPARA (0.43) FDPSMAPTLMNAHTTALDH1A1
SCHEMBL3480785 0.72 CA1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1610176-A2 UV decomposable molecules and a photopatternable monomolecular film formed therefrom SEIKO EPSON CORPORATION (JP) 2005-12-28 EP disclosed