SCHEMBL6536244

SCHEMBL6536244

CC(=O)N(Cc1ccccc1)C(=O)C(C)(C)C

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.51
RIPK1 Q13546 2/20 0.50
KMT2A Q03164 3/20 0.47
MEN1 O00255 2/20 0.47
CYP2C19 P33261 2/20 0.47
CYP3A4 P08684 1/20 0.47
CYP2C9 P11712 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
LMNA P02545 1/20 0.47
RECQL P46063 1/20 0.46
TSPO P30536 1/20 0.45
HTT P42858 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
CA12 O43570 1/20 0.44
CA9 Q16790 1/20 0.44
CRHBP P24387 1/20 0.44
CRHR2 Q13324 1/20 0.44
ALOX5 P09917 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4599100 0.88 RIPK1 (0.42) POLBRIPK1KMT2AMEN1CYP2C19
SCHEMBL2526727 0.85 LMNA (0.57) RIPK1KMT2AMEN1LMNATSPO
SCHEMBL9171120 0.84 MEN1 (0.44) POLBRIPK1KMT2AMEN1CYP2C19
Hydrochloric Acid SCHEMBL11682498 0.81 LMNA (0.53) RIPK1KMT2AMEN1LMNATSPO
SCHEMBL28693395 0.80 LMNA (0.49) RIPK1KMT2AMEN1LMNATSPO
SCHEMBL28705761 0.79 RECQL (0.58) POLBRIPK1KMT2AMEN1CYP2C19
SCHEMBL29191660 0.79 RIPK1 (0.41) POLBRIPK1KMT2AMEN1SMN1; SMN2
SCHEMBL20341352 0.78 AKT1 (0.49) RIPK1KMT2AMEN1LMNATSPO
SCHEMBL12265785 0.78 RIPK1 (0.72) POLBRIPK1KMT2AMEN1CYP2C19
SCHEMBL7800481 0.78 RIPK1 (0.72) POLBRIPK1KMT2AMEN1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6713523-B2 DECOLORING DYES FUJI PHOTO FILM CO., LTD. (JP) 2004-03-30 US disclosed
US-20020182530-A1 Polymerizable compound having an ethylenic unsaturated bond, a methine dye, and a radical generator that interacts with the dye to generate a radical FUJI PHOTO FILM CO., LTD. 2002-12-05 US disclosed
US-20020168494-A1 Photopolymerizable composition and photosensitive thermal recording material FUJI PHOTO FILM CO., LTD. 2002-11-14 US disclosed