SCHEMBL6536555

SCHEMBL6536555

C=C(C(=O)O)C(C)(C)C.CC(=CC1C2CC3CC(C2)CC1C3)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.31
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9649905 0.85 HSD11B1 (0.38) EPHX2HSD11B1
SCHEMBL244479 0.85 HSD11B1 (0.38) EPHX2HSD11B1
SCHEMBL6536553 0.73 THRB (0.31)
SCHEMBL6536551 0.73 THRB (0.31)
SCHEMBL18259758 0.72 L3MBTL1 (0.40) EPHX2HSD11B1
SCHEMBL584410 0.71 HSD11B1 (0.33) EPHX2HSD11B1
SCHEMBL8679625 0.70 PTGS1 (0.30)
SCHEMBL3804196 0.70 PTGS1 (0.30)
SCHEMBL5354983 0.69 CYP2C9 (0.33)
SCHEMBL23950 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6790580-B2 ETCHING RESISTANCE FUJITSU LIMITED (JP) 2004-09-14 US disclosed
US-20030143483-A1 Resist material and method for forming a resist pattern with the resist material FUJITSU LIMITED (JP) 2003-07-31 US disclosed