Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.32 |
| ▸ | RXRA | P19793 | 1/20 | 0.32 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.32 |
| ▸ | RXRB | P28702 | 1/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.32 |
| ▸ | RXRG | P48443 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9649905 | 1.00 | HSD11B1 (0.38) | HSD11B1MAPTTSHRCYP2C9ALDH1A1 | |
| SCHEMBL6536555 | 0.85 | EPHX2 (0.31) | HSD11B1EPHX2 | |
| SCHEMBL18259758 | 0.84 | L3MBTL1 (0.40) | HSD11B1EPHX2L3MBTL1 | |
| SCHEMBL584410 | 0.83 | HSD11B1 (0.33) | HSD11B1CYP2C9EPHX2L3MBTL1HSD17B10 | |
| SCHEMBL5354983 | 0.81 | CYP2C9 (0.33) | CYP2C9 | |
| SCHEMBL1271396 | 0.79 | L3MBTL1 (0.33) | HSD11B1L3MBTL1 | |
| SCHEMBL283708 | 0.79 | EPHX2 (0.33) | HSD11B1ALDH1A1EPHX2L3MBTL1HSD17B10 | |
| SCHEMBL3152896 | 0.76 | TSHR (0.34) | HSD11B1TSHREPHX2 | |
| SCHEMBL3023543 | 0.75 | EPHX2 (0.36) | HSD11B1MAPTEPHX2 | |
| SCHEMBL451262 | 0.74 | GLO1 (0.38) | HSD11B1MAPTTSHRALDH1A1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 248 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117004350-A | High-temperature-resistant high-humidity UV (ultraviolet) glue reducing adhesive tape | 北京序轮科技有限公司 | 2023-11-07 | — | — | CN | claimed |
| CN-115197663-A | UV (ultraviolet) viscosity reducing adhesive for wafer, preparation method of UV viscosity reducing adhesive and UV viscosity reducing adhesive tape for wafer | 芊惠半导体科技(苏州)有限公司 | 2022-10-18 | — | — | CN | claimed |
| CN-114381244-A | Zirconium dioxide grafted adamantane nano plugging agent and oil-based drilling fluid | 西南石油大学 | 2022-04-22 | — | — | CN | claimed |
| EP-3067395-B1 | ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER | SEIKO EPSON CORP (JP) | 2020-10-28 | — | — | EP | claimed |
| EP-3067396-B1 | ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT | SEIKO EPSON CORP (JP) | 2019-04-17 | — | — | EP | claimed |
| EP-2738229-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-04-18 | — | — | EP | claimed |
| CN-107925098-A | Fuel cell photocurable, fuel cell and encapsulating method | 三键有限公司 | 2018-04-17 | — | — | CN | claimed |
| EP-2738228-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-01-17 | — | — | EP | claimed |
| CN-106800619-A | A kind of polymethyl methacrylate and preparation method thereof | 万华化学集团股份有限公司 | 2017-06-06 | — | — | CN | claimed |
| EP-2871062-B1 | Production method of recording material, and recording material | SEIKO EPSON CORP (JP) | 2016-08-17 | — | — | EP | claimed |
| US-20120184652-A1 | CURABLE RESINS AND ARTICLES MADE THEREFROM | DIGITALOPTICS CORPORATION EAST (US) | 2012-07-19 | — | — | US | claimed |
| US-20120178859-A1 | CURABLE RESINS AND ARTICLES MADE THEREFROM | DIGITALOPTICS CORPORATION EAST (US) | 2012-07-12 | — | — | US | claimed |
| EP-2440601-A2 | CURABLE RESINS AND ARTICLES MADE THEREFROM | Digitaloptics Corporation East (US) | 2012-04-18 | — | — | EP | claimed |
| US-20100314591-A1 | CURABLE RESINS AND ARTICLES MADE THEREFROM | TESSERA RESEARCH LLC (US) | 2010-12-16 | — | — | US | claimed |
| WO-2010144763-A2 | CURABLE RESINS AND ARTICLES MADE THEREFROM | TESSERA RESEARCH LLC (US) | 2010-12-16 | — | — | WO | claimed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | claimed |
| US-20100104981-A1 | COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-29 | — | — | US | claimed |
| EP-1546221-B1 | FLUORINATED POLYMERS HAVING POLYCYCLIC GROUPS WITH FUSED 4-MEMBERED HETEROCYCLIC RINGS, USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2010-03-10 | — | — | EP | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| US-6262222-B1 | STABILITY; FOR MICROLITHOGRAPHY | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-07-17 | — | — | US | claimed |