Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 1/20 | 0.46 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA3 | P07451 | 1/20 | 0.42 |
| ▸ | CA4 | P22748 | 1/20 | 0.42 |
| ▸ | CA6 | P23280 | 1/20 | 0.42 |
| ▸ | CA5A | P35218 | 1/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.42 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.42 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6544186 | 0.95 | HTR6 (0.46) | HTR6PSIP1ALDH1A1CA1CA2 | |
| SCHEMBL6543913 | 0.86 | PSIP1 (0.47) | HTR6PSIP1ALDH1A1CA1CA2 | |
| SCHEMBL4076634 | 0.85 | HTR6 (0.55) | HTR6PSIP1ALDH1A1CA1CA2 | |
| SCHEMBL24360888 | 0.79 | GAA (0.52) | ALDH1A1CA1CA2CA12CA3 | |
| SCHEMBL6543930 | 0.77 | GAA (0.50) | ALDH1A1CA1CA2TDP1CA12 | |
| SCHEMBL26343879 | 0.76 | LMNA (0.53) | ALDH1A1CA1CA2CA9TSHR | |
| SCHEMBL778854 | 0.75 | HTR6 (0.50) | HTR6PSIP1ALDH1A1CA1CA2 | |
| SCHEMBL4327138 | 0.75 | HTR6 (0.50) | HTR6PSIP1ALDH1A1CA1CA2 | |
| SCHEMBL751577 | 0.75 | HTR6 (0.50) | HTR6PSIP1ALDH1A1CA1CA2 | |
| SCHEMBL11848869 | 0.74 | HTR6 (0.44) | HTR6PSIP1ALDH1A1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305394-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305394-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-04-28 | — | — | US | disclosed |
| US-20040248042-A1 | using material having both of dry etching resistance and high transparency in exposure light having a short wavelength such as F2 laser beam | DAIKIN INDUSTRIES, LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040234899-A1 | Method of forming fine pattern | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-11-25 | — | — | US | disclosed |
| EP-1439422-A1 | METHOD OF FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-07-21 | — | — | EP | disclosed |
| US-20040101787-A1 | Fine pattern forming method | DAIKIN INDUSTRIES, LTD. (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1413927-A1 | METHOD FOR FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-1376230-A1 | FINE PATTERN FORMING METHOD | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6054254-A | COATING WITH PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-25 | — | — | US | disclosed |
| US-5372914-A | Pattern forming method | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-12-13 | — | — | US | disclosed |
| US-5348838-A | Photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-09-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | CACNA1F, SLC6A5, IDUA | HTR6 4750/4885PSIP1 3980/4885ALDH1A1 3860/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.