SCHEMBL6544600

SCHEMBL6544600

COC(=O)OS(=O)(=O)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
BCAT1 P54687 1/20 0.47
ALDH1A1 P00352 2/20 0.46
LMNA P02545 2/20 0.46
HTT P42858 2/20 0.46
KDM4E B2RXH2 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
MAPT P10636 1/20 0.44
PSIP1 O75475 1/20 0.43
HSD11B1 P28845 3/20 0.43
KMT2A Q03164 1/20 0.42
TSHR P16473 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
MMP1 P03956 1/20 0.42
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42
MMP8 P22894 1/20 0.42
MMP13 P45452 1/20 0.42
POLB P06746 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28249179 0.98 BCAT1 (0.46) BCAT1ALDH1A1LMNAHTTKDM4E
SCHEMBL27492334 0.98 BCAT1 (0.46) BCAT1ALDH1A1LMNAHTTKDM4E
SCHEMBL9539575 0.87 TSHR (0.48) BCAT1ALDH1A1KDM4ESMN1; SMN2MAPT
SCHEMBL27775651 0.83 ALDH1A1 (0.42) ALDH1A1LMNAHTTPSIP1HSD11B1
SCHEMBL28199951 0.82 ALDH1A1 (0.55) ALDH1A1LMNAKDM4ESMN1; SMN2MAPT
SCHEMBL29098387 0.81 ALDH1A1 (0.53) ALDH1A1LMNAKDM4ESMN1; SMN2MAPT
SCHEMBL9315696 0.81 TSHR (0.53) ALDH1A1LMNASMN1; SMN2TSHRCA1
SCHEMBL10432314 0.80 KMT2A (0.47) ALDH1A1MAPTKMT2A
SCHEMBL30988391 0.79 HSD11B1 (0.46) BCAT1ALDH1A1SMN1; SMN2PSIP1HSD11B1
SCHEMBL111776 0.79 HSD11B1 (0.49) ALDH1A1LMNAHTTSMN1; SMN2PSIP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101735197-B Method for synthesizing Imatinib TIANJIN WEIJIE TECHNOLOGY CO LTD 2013-06-19 CN claimed
JP-56110721-A None JP disclosed
CN-118046659-A Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-05-17 CN disclosed
CN-118043459-A Chemically modified oligonucleotides 菲奥医药公司 2024-05-14 CN disclosed
CN-114072290-B On-press development type lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-04-30 CN disclosed
CN-117916096-A On-press development type lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-04-19 CN disclosed
CN-117881547-A On-press development type lithographic printing plate precursor and method for producing printing plate 富士胶片株式会社 2024-04-12 CN disclosed
CN-117881548-A Laminate body 富士胶片株式会社 2024-04-12 CN disclosed
CN-114450161-B Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-04-02 CN disclosed
CN-114531860-B Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-01-30 CN disclosed
EP-1414903-A1 POLYESTER POLYAMIDE MOLDING COMPOSITION GENERAL ELECTRIC COMPANY (US) 2004-05-06 EP disclosed
EP-1373361-A2 POLYESTER IONOMER COMPOSITION GENERAL ELECTRIC COMPANY (US) 2004-01-02 EP disclosed
WO-2002081564-A1 POLYESTER POLYAMIDE MOLDING COMPOSITION GENERAL ELECTRIC COMPANY (US) 2002-10-17 WO disclosed
WO-2002050157-A2 POLYESTER IONOMER COMPOSITION GENERAL ELECTRIC COMPANY (US) 2002-06-27 WO disclosed
EP-1185576-A1 POLYESTER MOLDING COMPOSITION GENERAL ELECTRIC COMPANY (US) 2002-03-13 EP disclosed
EP-1165692-A1 POLYESTER MOLDING COMPOSITION GENERAL ELECTRIC COMPANY (US) 2002-01-02 EP disclosed
WO-2000049089-A1 POLYESTER MOLDING COMPOSITION GENERAL ELECTRIC COMPANY (US) 2000-08-24 WO disclosed
WO-2000000534-A1 POLYESTER MOLDING COMPOSITION GENERAL ELECTRIC COMPANY (US) 2000-01-06 WO disclosed
WO-1999005986-A1 IMPROVED DENTAL FLOSS WHITEHILL ORAL TECHNOLOGIES, INC. (US) 1999-02-11 WO disclosed
JP-S56110721-A PREPARATION OF POLYESTER WITH EXCELLENT PARTICLE DISPERSIBILITY TORAY IND INC 1981-09-02 JP disclosed