Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.66 |
| ▸ | GAA | P10253 | 2/20 | 0.66 |
| ▸ | HTT | P42858 | 1/20 | 0.66 |
| ▸ | CA2 | P00918 | 3/20 | 0.62 |
| ▸ | CA5A | P35218 | 1/20 | 0.62 |
| ▸ | MMP2 | P08253 | 2/20 | 0.57 |
| ▸ | CA1 | P00915 | 1/20 | 0.57 |
| ▸ | MMP1 | P03956 | 1/20 | 0.57 |
| ▸ | MMP9 | P14780 | 1/20 | 0.57 |
| ▸ | MMP8 | P22894 | 1/20 | 0.57 |
| ▸ | MMP13 | P45452 | 1/20 | 0.57 |
| ▸ | MEN1 | O00255 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | F2 | P00734 | 1/20 | 0.53 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.53 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.53 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.51 |
| ▸ | DDX3X | O00571 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6544697 | 0.85 | ALDH1A1 (0.58) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL9398531 | 0.83 | KMT2A (0.66) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL11765302 | 0.83 | KMT2A (0.66) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL3477247 | 0.82 | KMT2A (0.89) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL9805877 | 0.80 | KMT2A (0.62) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL17443262 | 0.80 | CA2 (0.57) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL9580710 | 0.80 | KMT2A (1.00) | KMT2AGAAHTTCA2CA5A | |
| Benzene SCHEMBL27935914 | 0.79 | KMT2A (0.70) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL15617618 | 0.78 | KMT2A (0.56) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL205255 | 0.78 | KMT2A (0.75) | KMT2AGAAHTTCA2CA5A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040248042-A1 | using material having both of dry etching resistance and high transparency in exposure light having a short wavelength such as F2 laser beam | DAIKIN INDUSTRIES, LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040234899-A1 | Method of forming fine pattern | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-11-25 | — | — | US | disclosed |
| EP-1439422-A1 | METHOD OF FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-07-21 | — | — | EP | disclosed |
| US-20040101787-A1 | Fine pattern forming method | DAIKIN INDUSTRIES, LTD. (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1413927-A1 | METHOD FOR FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-1376230-A1 | FINE PATTERN FORMING METHOD | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6054254-A | COATING WITH PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-25 | — | — | US | disclosed |
| US-5372914-A | Pattern forming method | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-12-13 | — | — | US | disclosed |
| US-5348838-A | Photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-09-20 | — | — | US | disclosed |