SCHEMBL6545302

SCHEMBL6545302

COc1ccc(S)c(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 1/20 0.43
FABP4 P15090 1/20 0.43
FABP5 Q01469 1/20 0.43
KMT2A Q03164 4/20 0.42
MAPT P10636 3/20 0.42
MEN1 O00255 3/20 0.42
ALDH1A1 P00352 3/20 0.42
KDM4E B2RXH2 2/20 0.42
USP2 O75604 2/20 0.42
DUSP3 P51452 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
PDE4A P27815 2/20 0.41
PDE4B Q07343 2/20 0.41
PDE4C Q08493 2/20 0.41
PDE4D Q08499 2/20 0.41
CA12 O43570 2/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
CA4 P22748 2/20 0.41
CA7 P43166 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2858584 0.85 L3MBTL1 (0.39) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL31195811 0.84 FABP4 (0.46) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL28948965 0.84 FABP4 (0.46) FABP3FABP4FABP5KMT2AMAPT
Trifluoromethanesulfonic Acid SCHEMBL5088253 0.83 FABP3 (0.39) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL49609 0.78 FABP3 (0.44) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL26259629 0.77 MAPT (0.52) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL355567 0.76 CA1 (0.57) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL6263322 0.76 ALDH1A1 (0.56) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL8329781 0.76 PDE4B (0.50) FABP3FABP4FABP5KMT2AMAPT
SCHEMBL27757744 0.76 ALDH1A1 (0.52) FABP3FABP4FABP5KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110832397-A Composition for forming resist underlayer film, method for forming resist pattern, and method for manufacturing semiconductor device 日产化学株式会社 2020-02-21 CN disclosed
EP-0915136-B1 Photocurable paint composition for road markings SHOWA DENKO KK (JP) 2004-01-21 EP disclosed