SCHEMBL6548794

SCHEMBL6548794

CCC(=O)C[S+]1CCC(C)(C)C1.Cc1ccc(S(=O)(=O)[O-])cc1

nearest known ligand 0.34

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.34
LMNA P02545 1/20 0.34
CYP2D6 P10635 1/20 0.34
MAPK1 P28482 1/20 0.34
THPO P40225 1/20 0.34
TSHR P16473 1/20 0.34
ALDH1A1 P00352 6/20 0.33
KMT2A Q03164 4/20 0.33
MEN1 O00255 2/20 0.33
CYP2C9 P11712 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
POLB P06746 2/20 0.32
GAA P10253 1/20 0.32
HPGD P15428 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
HTT P42858 1/20 0.31
PKM P14618 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550404 0.93 KMT2A (0.34) CYP3A4LMNACYP2D6MAPK1THPO
SCHEMBL6549646 0.82 CYP3A4 (0.39) CYP3A4LMNACYP2D6MAPK1THPO
SCHEMBL6551068 0.81 ALDH1A1 (0.39) CYP3A4LMNACYP2D6MAPK1THPO
SCHEMBL6838374 0.80 TDP1 (0.33)
SCHEMBL6726409 0.79 LMNA (0.36) CYP3A4LMNACYP2D6MAPK1THPO
SCHEMBL6734431 0.79 L3MBTL1 (0.39) CYP3A4LMNACYP2D6MAPK1THPO
SCHEMBL6723138 0.79 LMNA (0.36) CYP3A4LMNACYP2D6MAPK1THPO
Bromide SCHEMBL4489549 0.78 TDP1 (0.32)
Trifluoromethanesulfonic Acid SCHEMBL6550396 0.78
SCHEMBL6551022 0.77 TSHR (0.37) CYP3A4LMNACYP2D6MAPK1THPO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6767686-B2 FOR USE IN LITHOGRAPHY SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-07-27 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020146641-A1 Chemically amplifying type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-10-10 US disclosed
EP-1207423-A1 Chemically amplifying type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-05-22 EP disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed