SCHEMBL6550659

SCHEMBL6550659

CCC(=O)CS(CC)(CC)OS(=O)(=O)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.37
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549785 0.86 FFAR3 (0.31)
SCHEMBL6550324 0.85 CES1 (0.37) HSD11B1
SCHEMBL6550547 0.83 ALDH1A1 (0.30)
SCHEMBL6548890 0.83 FAAH (0.35)
SCHEMBL6549192 0.82 FAAH (0.41) TDP1
SCHEMBL6549459 0.82 CA2 (0.33)
SCHEMBL6549850 0.81 HSD11B1 (0.37) HSD11B1TDP1
SCHEMBL6551050 0.80 CA2 (0.35)
SCHEMBL6550531 0.80 KMT2A (0.43) TDP1
SCHEMBL6728060 0.80 HSD11B1 (0.39) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed