SCHEMBL6549235

SCHEMBL6549235

CCC(=O)c1ccc(OS(=O)(=O)c2cc(Cl)ccc2Cl)cc1

nearest known ligand 0.49

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALPL P05186 3/20 0.49
MAPT P10636 2/20 0.48
ALDH1A1 P00352 2/20 0.48
ITGA1 P56199 1/20 0.48
GAA P10253 1/20 0.46
ALPI P09923 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.42
STS P08842 2/20 0.42
F2 P00734 1/20 0.41
MAPK1 P28482 1/20 0.41
ENPP3 O14638 2/20 0.40
ENPP1 P22413 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
CYP1A2 P05177 1/20 0.40
TSHR P16473 1/20 0.40
CYP2C19 P33261 1/20 0.40
ENPP2 Q13822 1/20 0.39
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3937703 0.73 ALDH1A1 (0.41) ALPLMAPTALDH1A1ITGA1GAA
SCHEMBL3937706 0.73 ALDH1A1 (0.41) ALPLMAPTALDH1A1ITGA1GAA
SCHEMBL3937698 0.73 ALDH1A1 (0.41) ALPLMAPTALDH1A1ITGA1GAA
SCHEMBL928274 0.72 ALPL (0.47) ALPLMAPTALDH1A1ITGA1GAA
SCHEMBL6142809 0.72 MMP1 (0.59) MAPTL3MBTL1SMN1; SMN2KMT2A
SCHEMBL2587493 0.72 STS (0.54) MAPTALDH1A1GAAL3MBTL1STS
SCHEMBL6551579 0.72 ALPL (0.43) ALPLMAPTALDH1A1ITGA1GAA
SCHEMBL27759976 0.71 GSK3B (0.55) MAPTL3MBTL1SMN1; SMN2TSHRKMT2A
SCHEMBL5672832 0.71 F2 (0.56) ALPLMAPTALDH1A1ITGA1GAA
SCHEMBL929662 0.71 ALPL (0.42) ALPLMAPTALDH1A1GAAALPI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0789279-B2 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2004-12-08 EP disclosed
CN-1145078-C Polymer and resist material ������ҩ��ҵ��ʽ���� 2004-04-07 CN disclosed
EP-0789279-B1 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2001-03-21 EP disclosed
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed
CN-1159453-A Polymer and resist material WAKO PURE CHEM IND LTD (JP) 1997-09-17 CN disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed