SCHEMBL6551579

SCHEMBL6551579

O=C(COS(=O)(=O)c1cc(Cl)ccc1Cl)c1ccc(OS(=O)(=O)c2cc(Cl)ccc2Cl)cc1OS(=O)(=O)c1cc(Cl)ccc1Cl

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALPL P05186 3/20 0.43
GAA P10253 1/20 0.42
MAPT P10636 3/20 0.41
ALDH1A1 P00352 3/20 0.41
ALPI P09923 2/20 0.39
ITGA1 P56199 1/20 0.37
F2 P00734 1/20 0.37
L3MBTL1 Q9Y468 2/20 0.36
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
HPGD P15428 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 2/20 0.35
LMNA P02545 1/20 0.34
MAPK1 P28482 1/20 0.34
HIF1A Q16665 1/20 0.34
AR P10275 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL928274 0.85 ALPL (0.47) ALPLGAAMAPTALDH1A1ALPI
SCHEMBL929662 0.79 ALPL (0.42) ALPLGAAMAPTALDH1A1ALPI
SCHEMBL27473862 0.74 ALDH1A1 (0.46) MAPTALDH1A1ITGA1L3MBTL1RAB9A
SCHEMBL1618830 0.73 ALPL (0.38) ALPLGAAMAPTALDH1A1ALPI
SCHEMBL6549235 0.72 ALPL (0.49) ALPLGAAMAPTALDH1A1ALPI
SCHEMBL6549919 0.70 ENPP3 (0.48) MAPTALDH1A1
SCHEMBL11841711 0.69 ALPL (0.51) ALPLGAAMAPTALDH1A1ALPI
SCHEMBL6115619 0.69 MCL1 (0.47) ALPLGAAMAPTALDH1A1ALPI
SCHEMBL929661 0.68 ALPL (0.57) ALPLGAAMAPTALDH1A1ALPI
SCHEMBL8124710 0.68 MAPT (0.44) MAPTALDH1A1L3MBTL1RAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0789279-B2 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2004-12-08 EP disclosed
EP-0789279-B1 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2001-03-21 EP disclosed
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed