SCHEMBL6549709

SCHEMBL6549709

CCCCC(=O)C[S+](C)C1CCCCC1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.33

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.32
MEN1 O00255 1/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31
KMT2A Q03164 1/20 0.31
EPHX2 P34913 1/20 0.30
ALDH1A1 P00352 1/20 0.30
HTT P42858 1/20 0.30
CES2 O00748 1/20 0.30
CES1 P23141 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549426 0.96 NAAA (0.37) NAAAMEN1MAPTKMT2AEPHX2
SCHEMBL6550424 0.95 NAAA (0.39) NAAAMAPTKMT2AEPHX2CES2
SCHEMBL6549856 0.95 NAAA (0.32) NAAAEPHX2
SCHEMBL6551148 0.91 EPHX2 (0.31) NAAAEPHX2
SCHEMBL6736712 0.87 NAAA (0.39) NAAAMEN1POLBMAPTKMT2A
SCHEMBL6549177 0.86 EPHX2 (0.32) NAAAEPHX2
Trifluoromethanesulfonic Acid SCHEMBL6549464 0.86 NAAA (0.31) NAAAMEN1POLBMAPTKMT2A
SCHEMBL7160641 0.84 NAAA (0.35) NAAAKMT2AEPHX2
SCHEMBL7160025 0.84 NAAA (0.35) NAAAKMT2AEPHX2
SCHEMBL6549413 0.83 MMP1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed