SCHEMBL6550424

SCHEMBL6550424

CCCCCCC(=O)C[S+](C)C1CCCCC1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.40

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 3/20 0.39
HAO1 Q9UJM8 1/20 0.34
EPHX2 P34913 2/20 0.34
CES2 O00748 3/20 0.33
CES1 P23141 3/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
EPHX1 P07099 4/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549426 0.99 NAAA (0.37) NAAAHAO1EPHX2CES2CES1
SCHEMBL6549709 0.95 NAAA (0.32) NAAAEPHX2CES2CES1MAPT
SCHEMBL6549856 0.92 NAAA (0.32) NAAAEPHX2
SCHEMBL6551148 0.88 EPHX2 (0.31) NAAAEPHX2
SCHEMBL6736720 0.88 NAAA (0.47) NAAAHAO1EPHX2MAPTKMT2A
SCHEMBL6734934 0.87 NAAA (0.45) NAAAEPHX2CES2CES1MAPT
Trifluoromethanesulfonic Acid SCHEMBL6551170 0.86 NAAA (0.38) NAAACES2CES1KMT2A
Trifluoromethanesulfonic Acid SCHEMBL6550634 0.85 NAAA (0.36) NAAACES2CES1KMT2A
SCHEMBL6549177 0.84 EPHX2 (0.32) NAAAEPHX2EPHX1
SCHEMBL6736712 0.82 NAAA (0.39) NAAAEPHX2CES2CES1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed