Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6550449

CC[S+](CC)CC(=O)C1CCCC1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.31

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Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6550701 0.98 TSHR (0.32) TSHRL3MBTL1
SCHEMBL6551431 0.86 CA1 (0.31)
Trifluoromethanesulfonic Acid SCHEMBL6549578 0.86 NAAA (0.33)
SCHEMBL6549534 0.85 CA2 (0.33)
SCHEMBL6550699 0.85 CA1 (0.30)
Trifluoromethanesulfonic Acid SCHEMBL6549828 0.85 NAAA (0.35)
Trifluoromethanesulfonic Acid SCHEMBL6551131 0.84 SMN1; SMN2 (0.31)
SCHEMBL6549472 0.84 CA2 (0.32)
SCHEMBL6723131 0.83 CES2 (0.37) TSHRL3MBTL1
Trifluoromethanesulfonic Acid SCHEMBL6549558 0.83 CES2 (0.31) TSHRL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed