SCHEMBL6551010

SCHEMBL6551010

Cc1ccc(C(=O)C(C)(C)S(=O)(=O)c2ccc(C)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.46
CA2 P00918 3/20 0.46
ALDH1A1 P00352 6/20 0.44
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
GAA P10253 2/20 0.43
CES2 O00748 1/20 0.43
CES1 P23141 1/20 0.43
MAPT P10636 1/20 0.42
HPGD P15428 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
PTPN1 P18031 1/20 0.42
CA1 P00915 2/20 0.41
MMP1 P03956 1/20 0.41
MMP2 P08253 1/20 0.41
MMP9 P14780 1/20 0.41
MMP8 P22894 1/20 0.41
MMP13 P45452 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C9 P11712 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL209160 0.91 RECQL (0.51) LMNAALDH1A1KMT2AMEN1CES2
SCHEMBL8669976 0.91 DNMT1 (0.41) LMNACA2ALDH1A1KMT2AMEN1
SCHEMBL5272382 0.89 ALDH1A1 (0.47) LMNACA2ALDH1A1KMT2AMEN1
SCHEMBL12757124 0.87 GFER (0.47) LMNAALDH1A1KMT2ASMN1; SMN2MMP13
SCHEMBL3425319 0.87 DNMT1 (0.38) LMNACA2ALDH1A1KMT2AMEN1
SCHEMBL12757096 0.87 LMNA (0.44) LMNACA2ALDH1A1KMT2AMEN1
SCHEMBL2325285 0.85 AKR1C3 (0.44) LMNACA2ALDH1A1KMT2AMEN1
SCHEMBL12757143 0.85 LMNA (0.43) LMNACA2ALDH1A1KMT2AMEN1
SCHEMBL29914242 0.85 CA1 (0.52) LMNACA2ALDH1A1KMT2AMEN1
Benzophenone SCHEMBL19358627 0.84 AKR1C3 (0.43) LMNACA2ALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0789279-B2 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2004-12-08 EP disclosed
CN-1145078-C Polymer and resist material ������ҩ��ҵ��ʽ���� 2004-04-07 CN disclosed
EP-0789279-B1 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2001-03-21 EP disclosed
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed
CN-1159453-A Polymer and resist material WAKO PURE CHEM IND LTD (JP) 1997-09-17 CN disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed