SCHEMBL6551017

SCHEMBL6551017

CC(C)C(=O)CS(C)(C)OS(=O)(=O)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CXCR2 P25025 2/20 0.33
CXCR1 P25024 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6548705 0.82 CA2 (0.37)
SCHEMBL6549485 0.81 CA2 (0.36)
SCHEMBL6551473 0.81 CXCR2 (0.30) CXCR2
SCHEMBL6550463 0.81 CXCR2 (0.30) CXCR2
SCHEMBL6551443 0.79 ALDH1A1 (0.31)
SCHEMBL6736327 0.76 HSD11B1 (0.40)
SCHEMBL6549850 0.76 HSD11B1 (0.37)
SCHEMBL6549745 0.74 CES1 (0.36)
SCHEMBL6548747 0.74 FFAR3 (0.31)
SCHEMBL6550735 0.71 FAAH (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed