SCHEMBL6551409

SCHEMBL6551409

CC(C)(C)C=COC(=O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.50
TSHR P16473 4/20 0.50
ALDH1A1 P00352 4/20 0.50
HSD17B10 Q99714 1/20 0.50
LMNA P02545 2/20 0.47
F2 P00734 1/20 0.47
MAPT P10636 3/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
MAPK1 P28482 1/20 0.43
HIF1A Q16665 1/20 0.43
CYP2D6 P10635 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2C19 P33261 1/20 0.41
KMT2A Q03164 4/20 0.40
TP53 P04637 1/20 0.40
SLC6A3 Q01959 2/20 0.40
HTR1A P08908 1/20 0.40
SCN1A P35498 1/20 0.40
SCN5A Q14524 1/20 0.40
SCN2A Q99250 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28182671 0.82 LMNA (0.61) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL23945318 0.79 TSHR (0.54) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL2434823 0.79 TSHR (0.54) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL628707 0.79 TSHR (0.54) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL72654 0.78 TSHR (0.58) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL17714426 0.77 TSHR (0.57) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL3234177 0.77 TSHR (0.57) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL2971855 0.76 LMNA (0.54) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL11926763 0.76 LMNA (0.48) TDP1TSHRALDH1A1HSD17B10LMNA
SCHEMBL27461543 0.76 LMNA (0.48) TDP1TSHRALDH1A1HSD17B10LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1048457-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2004-12-15 EP disclosed
EP-0788118-B1 Low dielectric polymer and film, substrate and electronic part using the same TDK CORP (JP) 2002-11-20 EP disclosed
US-6455224-B1 SUPPORT WITH HYDROPHILIC SURFACE AND PHOTOSENSITIVE LAYER CONTAINING INFRARED ABSORBENT WHICH CHANGES FROM HYDROPHILIC TO HYDROPHOBIC BY HEAT AND HYDROPHILIC POLYMER HAVING FUNCTIONAL GROUP RENDERING LAYER WATER DEVELOPABLE FUJI PHOTO FILM CO., LTD. (JP) 2002-09-24 US disclosed
EP-1048457-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2000-11-02 EP disclosed
US-5914283-A FUMARIC ACID DIESTER MONOMER-CONTAINING POLYMER FILM; HEAT RESISTANCE, WEATHER RESISTANCE TDK CORPORATION (JP) 1999-06-22 US disclosed
EP-0788118-A1 Low dielectric polymer and film, substrate and electronic part using the same TDK Corporation (JP) 1997-08-06 EP disclosed