Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A2 | O15244 | 1/20 | 0.30 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.30 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | STAT6 | P42226 | 1/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.30 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.30 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.30 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.30 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1939655 | 0.77 | SLC22A2 (0.30) | SLC22A2SLC22A1GRIN2DGRIN3BLMNA | |
| SCHEMBL641692 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL11302602 | 0.76 | LMNA (0.41) | SLC22A2SLC22A1GRIN2DGRIN3BLMNA | |
| SCHEMBL1592795 | 0.75 | GRIN2D (0.31) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL4543539 | 0.75 | THRB (0.37) | — | |
| SCHEMBL677091 | 0.74 | HSD11B1 (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL7661558 | 0.74 | — | — | |
| SCHEMBL28732515 | 0.72 | CD81 (0.35) | — | |
| SCHEMBL677864 | 0.71 | KMT2A (0.32) | — | |
| Acrylic Acid SCHEMBL28717241 | 0.70 | NPSR1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1963667-B | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO | 2010-09-29 | — | — | CN | disclosed |
| CN-100371826-C | Sulfonate and photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2008-02-27 | — | — | CN | disclosed |
| CN-1963667-A | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2007-05-16 | — | — | CN | disclosed |
| CN-1229693-C | Optical enhancement right photoetching rubber composite and sulfonium salt | SUMITOMO CHEMICAL CO (JP) | 2005-11-30 | — | — | CN | disclosed |
| EP-1167349-B1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2004-12-01 | — | — | EP | disclosed |
| CN-1495526-A | Sulfonate and photoresist composition | 住友化学工业株式会社 | 2004-05-12 | — | — | CN | disclosed |
| CN-1488996-A | Chemically Amplified Photoresist Composition | ס�ѻ�ѧ��ҵ��ʽ���� | 2004-04-14 | — | — | CN | disclosed |
| US-6548220-B2 | Containing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | disclosed |
| US-20020015913-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-07 | — | — | US | disclosed |
| CN-1330289-A | Optical enhancement right photoetching rubber composite and sulfonium salt | SUMITOMO CHEMICAL CO (JP) | 2002-01-09 | — | — | CN | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |