SCHEMBL6561439

SCHEMBL6561439

C=CC(C=C)(CO[SiH3])c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.35
TSHR P16473 4/20 0.35
ALDH1A1 P00352 3/20 0.35
HTT P42858 1/20 0.33
KIF11 P52732 1/20 0.31
KCNN4 O15554 1/20 0.30
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL82858 0.80 TSHR (0.35) MAPK1TSHRALDH1A1HTTKIF11
SCHEMBL135715 0.77 MAPK1 (0.38) MAPK1TSHRALDH1A1HTTKCNN4
SCHEMBL10610048 0.75 CYP2C9 (0.48) TSHRALDH1A1HTTKIF11
SCHEMBL1313620 0.74 L3MBTL1 (0.30) TSHR
SCHEMBL238217 0.72 KIF11 (0.41) MAPK1TSHRALDH1A1KIF11KCNN4
SCHEMBL5701475 0.71
SCHEMBL7692733 0.69 KCNN4 (0.38) TSHRALDH1A1HTTKIF11KCNN4
SCHEMBL9402727 0.69 ALDH1A1 (0.33) TSHRALDH1A1HTTKIF11
SCHEMBL705543 0.68 MAPK1 (0.44) MAPK1ALDH1A1KCNN4
SCHEMBL109031 0.68 TAAR1 (0.52) MAPK1ALDH1A1KCNN4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN claimed
EP-3375808-B1 PARTICLES, PARTICLE MATERIAL, CONNECTING MATERIAL, AND CONNECTION STRUCTURE SEKISUI CHEMICAL CO LTD (JP) 2022-12-21 EP disclosed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN disclosed
CN-114085382-A Hydrogen-containing poly titanium boron siloxane flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2022-02-25 CN disclosed
CN-114068067-A Metal-containing particle, connecting material, connecting structure and method for producing same, conduction test member, and conduction test device 积水化学工业株式会社 2022-02-18 CN disclosed
CN-107709414-B Particle, particle material, connecting material, and connecting structure 积水化学工业株式会社 2021-12-28 CN disclosed
CN-111095441-B Metal-containing particle, connecting material, connecting structure, method for producing connecting structure, member for conduction test, and conduction test device 积水化学工业株式会社 2021-11-23 CN disclosed
CN-108140450-B Metal-containing particle, connecting material, connection structure, and method for producing connection structure 积水化学工业株式会社 2021-08-03 CN disclosed
US-20200269315-A1 METAL-CONTAINING PARTICLE, CONNECTION MATERIAL, CONNECTION STRUCTURE, METHOD FOR MANUFACTURING CONNECTION STRUCTURE, CONDUCTION INSPECTION MEMBER, AND CONDUCTION INSPECTION DEVICE SEKISUI CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed
EP-3686903-A1 METAL-CONTAINING PARTICLE, CONNECTION MATERIAL, CONNECTION STRUCTURE, METHOD FOR MANUFACTURING CONNECTION STRUCTURE, CONDUCTION INSPECTION MEMBER, AND CONDUCTION INSPECTION DEVICE Sekisui Chemical Co., Ltd. (JP) 2020-07-29 EP disclosed
CN-110627974-A High-heat-resistance phosphorus-silicon flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2019-12-31 CN disclosed
EP-3375808-A1 PARTICLES, PARTICLE MATERIAL, CONNECTING MATERIAL, AND CONNECTION STRUCTURE Sekisui Chemical Co., Ltd. (JP) 2018-09-19 EP disclosed
US-9260458-B2 Method of producing an organic silicon compound DOW CORNING CORPORATION (US) 2016-02-16 US disclosed
US-20150141689-A1 Method Of Producing An Organic Silicon Compound DOW TORAY CO., LTD. (JP) 2015-05-21 US disclosed
EP-2797855-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND Dow Corning Toray Co., Ltd. (JP) 2014-11-05 EP disclosed
WO-2013100166-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND DOW CORNING TORAY CO., LTD. (JP) 2013-07-04 WO disclosed
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed