Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | LTA4H | P09960 | 1/20 | 0.44 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.42 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.41 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.41 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8763564 | 0.98 | MEN1 (0.46) | KMT2AMEN1LTA4HHRH3CA2 | |
| SCHEMBL2944821 | 0.93 | MEN1 (0.43) | KMT2AMEN1LTA4HHRH3CA2 | |
| SCHEMBL12453115 | 0.83 | DAO (0.43) | KMT2AMEN1CA2LMNAHTT | |
| SCHEMBL22123904 | 0.83 | LMNA (0.47) | KMT2AMEN1CA2CA12CA1 | |
| SCHEMBL778057 | 0.83 | CA1 (0.43) | KMT2AMEN1CA2CA12CA1 | |
| SCHEMBL16503442 | 0.82 | LTA4H (0.41) | KMT2AMEN1LTA4HHRH3CA2 | |
| SCHEMBL5160716 | 0.82 | CA2 (0.54) | KMT2AMEN1CA2CA12CA1 | |
| SCHEMBL20526046 | 0.81 | CYP2D6 (0.50) | KMT2AMEN1CA2CA12CA1 | |
| SCHEMBL778786 | 0.81 | CA1 (0.37) | KMT2AMEN1CA2CA12CA1 | |
| SCHEMBL7735405 | 0.81 | DAO (0.41) | KMT2AMEN1LMNATSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115988939-A | Method for realizing interface welding of perovskite solar cell by self-repairing polymer | 江西师范大学 | 2023-04-18 | — | — | CN | claimed |
| EP-1163550-B1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | FUJIFILM ELECTRONIC MATERIALS (US) | 2007-05-30 | — | — | EP | claimed |
| CN-115988939-A | Method for realizing interface welding of perovskite solar cell by self-repairing polymer | 江西师范大学 | 2023-04-18 | — | — | CN | disclosed |
| CN-108697595-B | Microencapsulated resin particles containing silica, method for producing same and use thereof | 积水化成品工业株式会社 | 2022-01-14 | — | — | CN | disclosed |
| CN-113795532-A | Resist underlayer film forming composition containing alicyclic compound terminal polymer | 日产化学株式会社 | 2021-12-14 | — | — | CN | disclosed |
| CN-112513108-A | Organic-inorganic composite particles, method for producing same, and use thereof | 积水化成品工业株式会社 | 2021-03-16 | — | — | CN | disclosed |
| WO-2021024464-A1 | RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED PRODUCT, CURED PRODUCT, PATTERNED CURED PRODUCT, INTERLAYER INSULATION FILM, COVER COATING LAYER, SURFACE PROTECTION FILM, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2021-02-11 | — | — | WO | disclosed |
| US-10626287-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, and process for producing device | FUJIFILM CORPORATION (JP) | 2020-04-21 | — | — | US | disclosed |
| US-10344177-B2 | Under layer film-forming composition for imprints and method for forming pattern | FUJIFILM CORPORATION (JP) | 2019-07-09 | — | — | US | disclosed |
| US-10246605-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device | FUJIFILM CORPORATION (JP) | 2019-04-02 | — | — | US | disclosed |
| US-10191375-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device | FUJIFILM CORPORATION (JP) | 2019-01-29 | — | — | US | disclosed |
| WO-2009010405-A1 | LASER-SENSITIVE COATING FORMULATION | BASF SE (CH) | 2009-01-22 | — | — | WO | disclosed |
| EP-1981717-A1 | COATING COMPOSITION FOR MARKING SUBSTRATES | Ciba Holding Inc. (CH) | 2008-10-22 | — | — | EP | disclosed |
| WO-2007088104-A1 | COATING COMPOSITION FOR MARKING SUBSTRATES | CIBA HOLDING INC. (CH) | 2007-08-09 | — | — | WO | disclosed |
| US-6696219-B2 | MULTILAYER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-24 | — | — | US | disclosed |
| US-20020028409-A1 | Positive resist laminate | FUJI PHOTO FILM CO., LTD. | 2002-03-07 | — | — | US | disclosed |
| US-5981752-A | Tricyclic compounds having fungicidal activity, their preparation and their use | SANKYO COMPANY, LIMITED (JP) | 1999-11-09 | — | — | US | disclosed |
| US-5773618-A | PYRROLOQUINOLINONE DERIVATIVES | SANKYO COMPANY, LIMITED (JP) | 1998-06-30 | — | — | US | disclosed |
| US-5489501-A | MIXTURES OF TWO COORDINATION COMPOUNDS WHICH REACT TO FORM NEW COORDINATION COMPOUND WHILE CAUSING VISIBLE COLOR CHANGES | RICOH COMPANY, LTD. (JP) | 1996-02-06 | — | — | US | disclosed |
| US-5446011-A | Imagewise coloring when heating; mixture of n-substituted indole, aromatic polyhydroxy compound, carbonyl compound and an acid | RICOH COMPANY, LTD. (JP) | 1995-08-29 | — | — | US | disclosed |