Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LSS | P48449 | 1/20 | 0.56 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.53 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.53 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.53 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.53 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.53 |
| ▸ | HDAC1 | Q13547 | 7/20 | 0.50 |
| ▸ | HDAC2 | Q92769 | 7/20 | 0.50 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | CASP3 | P42574 | 1/20 | 0.49 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.49 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.49 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.49 |
| ▸ | LTA4H | P09960 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | HRH3 | Q9Y5N1 | 4/20 | 0.47 |
| ▸ | MMP3 | P08254 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13301359 | 1.00 | LSS (0.56) | LSSCHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL1754085 | 0.88 | KCNA3 (0.58) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL14524692 | 0.85 | SMN1; SMN2 (0.47) | LTA4HHDAC6 | |
| SCHEMBL12958258 | 0.84 | LTA4H (0.53) | HDAC1HDAC2LTA4HHRH3 | |
| SCHEMBL13301365 | 0.83 | ALDH1A1 (0.53) | CHRNA7MAPTLTA4HHRH1 | |
| SCHEMBL10803113 | 0.81 | LSS (0.64) | LSSCHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL3073978 | 0.80 | MMP2 (0.41) | LSSHDAC1HDAC2HRH3MMP3 | |
| SCHEMBL2601695 | 0.80 | PPARA (0.42) | LSSLTA4H | |
| SCHEMBL7462021 | 0.80 | NPC1 (0.51) | LSSCHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL15672914 | 0.79 | KCNA3 (0.64) | LSSCHRNB2CHRNB4CHRNA3CHRNA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6806019-B2 | COATING SUBSTRATES WITH PHOTORESIST MIXTURES COMPRISING NOVOLAKS, ACRYLIC ESTER COPOLYMERS AND PHOTOSENSITIZERS, THEN EXPOSING THE COATINGS AND DEVELOPING, TO FORM SEMICONDUCTORS OR FLAT PANEL DISPLAYS | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-10-19 | — | — | US | disclosed |
| US-20040170917-A1 | Method of forming thick resist pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-02 | — | — | US | disclosed |
| EP-1400850-A1 | METHOD OF FORMING THICK RESIST PATTERN | CLARIANT INTERNATIONAL LTD. (CH) | 2004-03-24 | — | — | EP | disclosed |
| EP-1345081-A1 | HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN | Clariant International Ltd. (CH) | 2003-09-17 | — | — | EP | disclosed |
| US-6537719-B1 | Both a resin and a photosensitive material, wherein a fluorescent material is incorporated | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-25 | — | — | US | disclosed |
| US-20030022093-A1 | High-resolution photosensitive resin composition usable with i-line and method of forming pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-30 | — | — | US | disclosed |
| EP-1126319-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-08-22 | — | — | EP | disclosed |
| EP-1087260-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-03-28 | — | — | EP | disclosed |