SCHEMBL6562756

SCHEMBL6562756

C=C[Si](C=C)(OC)c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33
CA4 P22748 1/20 0.33
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31
HDAC8 Q9BY41 1/20 0.30
TRPA1 O75762 1/20 0.30
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL94036 0.81 ALDH1A1 (0.36) ALDH1A1TSHR
SCHEMBL3012600 0.77 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL143426 0.77 ALDH1A1 (0.33) ALDH1A1TSHRCA4ESR1ESR2
SCHEMBL294669 0.77 ALDH1A1 (0.33) ALDH1A1TSHRCA4ESR1ESR2
SCHEMBL6561434 0.77 MEN1 (0.34) ALDH1A1TSHR
SCHEMBL336006 0.77 ESR1 (0.32) ALDH1A1TSHRESR1ESR2
SCHEMBL12302824 0.76 ALDH1A1 (0.32) ALDH1A1TSHR
SCHEMBL3481365 0.76 ALDH1A1 (0.32) ALDH1A1TSHR
SCHEMBL296744 0.76 ALDH1A1 (0.32) ALDH1A1TSHR
SCHEMBL296246 0.76 ESR1 (0.34) ALDH1A1TSHRCA4ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117844447-A Thermosetting organic silicon die bond adhesive for LED, and preparation method and application thereof 江苏诚睿达光电有限公司 2024-04-09 CN claimed
CN-110627974-A High-heat-resistance phosphorus-silicon flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2019-12-31 CN claimed
CN-117844447-A Thermosetting organic silicon die bond adhesive for LED, and preparation method and application thereof 江苏诚睿达光电有限公司 2024-04-09 CN disclosed
CN-116675819-A Resin particle, connection material, and connection structure 积水化学工业株式会社 2023-09-01 CN disclosed
CN-110088160-B Resin particle, connection material, and connection structure 积水化学工业株式会社 2023-06-13 CN disclosed
EP-3375808-B1 PARTICLES, PARTICLE MATERIAL, CONNECTING MATERIAL, AND CONNECTION STRUCTURE SEKISUI CHEMICAL CO LTD (JP) 2022-12-21 EP disclosed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN disclosed
CN-114085382-A Hydrogen-containing poly titanium boron siloxane flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2022-02-25 CN disclosed
CN-114068067-A Metal-containing particle, connecting material, connecting structure and method for producing same, conduction test member, and conduction test device 积水化学工业株式会社 2022-02-18 CN disclosed
CN-107709414-B Particle, particle material, connecting material, and connecting structure 积水化学工业株式会社 2021-12-28 CN disclosed
CN-111095441-B Metal-containing particle, connecting material, connecting structure, method for producing connecting structure, member for conduction test, and conduction test device 积水化学工业株式会社 2021-11-23 CN disclosed
WO-2013100166-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND DOW CORNING TORAY CO., LTD. (JP) 2013-07-04 WO disclosed
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed
US-5439746-A Formed by coating or impregnating a reinforcement sheet and curing; mechanical strength; corrosion and heat resistance; electrical properties KABUSHIKI KAISHA TOSHIBA (JP) 1995-08-08 US disclosed
EP-0139234-B1 RESIN COMPOSITION KABUSHIKI KAISHA TOSHIBA (JP) 1989-11-29 EP disclosed
US-4599155-A POLYORTHOESTERS;SHRINKAGE INHIBITION;NONCRACKING;COATINGS KABUSHIKI KAISHA TOSHIBA (JP) 1986-07-08 US disclosed
EP-0139234-A2 Resin composition KABUSHIKI KAISHA TOSHIBA (JP) 1985-05-02 EP disclosed