Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6566070

CCCOc1cccc2c([S+]3CCCC3)cccc12.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.38

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Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
CYP2A6 P11509 1/20 0.36
CNR1 P21554 1/20 0.36
CNR2 P34972 1/20 0.36
RXFP1 Q9HBX9 1/20 0.35
KCNH2 Q12809 7/20 0.34
TSHR P16473 2/20 0.33
ACHE P22303 2/20 0.32
HTR1B P28222 1/20 0.32
BCHE P06276 1/20 0.32
SLC2A1 P11166 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL703652 0.93 KMT2A (0.42) KMT2AMEN1CNR1CNR2RXFP1
Trifluoromethanesulfonic Acid SCHEMBL6564934 0.91 ACHE (0.34) KMT2AMEN1RXFP1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL6563968 0.91 ALDH1A1 (0.39) KMT2AMEN1CYP2A6RXFP1KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564009 0.88 KDM4E (0.36) KMT2AMEN1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL36280 0.88 SLC2A1 (0.42) KMT2AMEN1CNR1CNR2KCNH2
Trifluoromethanesulfonic Acid SCHEMBL29354733 0.88 SLC2A1 (0.42) KMT2AMEN1CNR1CNR2KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564421 0.87 KDM4E (0.32) KCNH2TSHRACHE
Trifluoromethanesulfonic Acid SCHEMBL6566199 0.85 ELANE (0.36) RXFP1KCNH2ACHEBCHE
Trifluoromethanesulfonic Acid SCHEMBL7796145 0.84 ACHE (0.38) KMT2AMEN1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL646424 0.84 HTT (0.35) KMT2AMEN1TSHRACHESLC2A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed