Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15131250 | 0.80 | PRKCA (0.32) | ALDH1A1CRBN | |
| SCHEMBL23709473 | 0.78 | CYP2C9 (0.41) | USP2TSHRCTSK | |
| SCHEMBL19821897 | 0.78 | — | — | |
| SCHEMBL28142432 | 0.74 | — | — | |
| SCHEMBL27761929 | 0.73 | ALOX15 (0.37) | — | |
| Hydrochloric Acid SCHEMBL27557442 | 0.72 | ALOX15 (0.40) | — | |
| SCHEMBL1561818 | 0.70 | — | — | |
| SCHEMBL305036 | 0.69 | CTSK (0.40) | ALDH1A1USP2TSHRCTSKHSD17B10 | |
| SCHEMBL15296654 | 0.68 | — | — | |
| SCHEMBL9784727 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117337314-A | Acid dianhydride | 三菱瓦斯化学株式会社 | 2024-01-02 | — | — | CN | disclosed |
| CN-116096784-B | Bisimide phenol compounds | 三菱瓦斯化学株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116096784-A | Bisimide phenol compounds | 三菱瓦斯化学株式会社 | 2023-05-09 | — | — | CN | disclosed |
| CN-111788176-A | Compound, resin, composition, and film-forming material for lithography using same | 三菱瓦斯化学株式会社 | 2020-10-16 | — | — | CN | disclosed |
| EP-0875906-B1 | Electronic part and process for manufacturing the same | JSR CORP (JP) | 2004-04-07 | — | — | EP | disclosed |
| US-6084053-A | AS STRUCTURAL COMPONENT, A DIELECTRIC POLYIMIDE MATERIAL HAVING AT LEAST ONE FLUORENE-CONTAINING STRUCTURAL UNIT; APPLYING POLYIMIDE SOLUTION TO SUBSTRATE, AND DRYING TO FORM THE DIELECTRIC; HEAT RESISTANCE, LOW DIELECTRIC CONSTANT | JSR CORPORATION (JP) | 2000-07-04 | — | — | US | disclosed |
| EP-0875906-A2 | Electronic part and process for manufacturing the same | JSR Corporation (JP) | 1998-11-04 | — | — | EP | disclosed |