Tetraphenylphosphonium

Tetraphenylphosphonium

SCHEMBL6567177

[O-]B([O-])[O-].c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1.c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1.c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 1/20 0.41
MAPT P10636 1/20 0.33
HPGD P15428 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MGLL Q99685 1/20 0.33
HSD17B10 Q99714 1/20 0.33
CYP3A4 P08684 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ALDH1A1 P00352 2/20 0.32
TSHR P16473 2/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
DPP4 P27487 2/20 0.30
CA4 P22748 1/20 0.30
CA6 P23280 1/20 0.30
CA5A P35218 1/20 0.30
CA7 P43166 1/20 0.30
ENPP2 Q13822 1/20 0.30
CA14 Q9ULX7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraphenylphosphonium SCHEMBL4428554 1.00 HIF1A (0.41) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL7172885 0.97 HIF1A (0.39) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL7179570 0.92 HIF1A (0.36) HIF1ATDP1TSHRCYP2D6
Tetraphenylphosphonium SCHEMBL7132231 0.88 HIF1A (0.38) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL7172888 0.88 CA4 (0.39) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL29362652 0.87 HIF1A (0.50) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL6469728 0.85 UQCRB (0.38) HIF1AMGLLHSD17B10CYP3A4TDP1
Tetraphenylphosphonium SCHEMBL49763 0.85 HIF1A (0.39) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL2870352 0.84 HIF1A (0.43) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL19921940 0.83 HIF1A (0.47) HIF1AMAPTHPGDSMN1; SMN2MGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116348530-A Method for producing polysiloxane, composition containing polysiloxane, and molded body 三菱瓦斯化学株式会社 2023-06-27 CN claimed
US-5412028-A Blend of polybutylene terephthalate, core-shell polymer, epoxidized novolak, blow molding LUCKY, LTD. (KR) 1995-05-02 US claimed
CN-120192629-A Resin composition 味之素株式会社 2025-06-24 CN disclosed
CN-120134737-A Resin sheet with metal foil 味之素株式会社 2025-06-13 CN disclosed
CN-120134736-A Resin sheet with metal foil 味之素株式会社 2025-06-13 CN disclosed
CN-119978708-A Resin sheet and method for producing same, method for producing circuit board, and resin composition 味之素株式会社 2025-05-13 CN disclosed
CN-119993845-A Method for manufacturing circuit board 味之素株式会社 2025-05-13 CN disclosed
CN-119923423-A Polymerizable composition for optical material, method for producing same, and optical material 三井化学株式会社 2025-05-02 CN disclosed
CN-113667302-B Resin composition 味之素株式会社 2025-04-29 CN disclosed
CN-119899528-A Thermosetting maleimide resin composition 信越化学工业株式会社 2025-04-29 CN disclosed
CN-119833408-A Method for manufacturing semiconductor chip package 味之素株式会社 2025-04-15 CN disclosed
CN-115315785-A Sheet for manufacturing semiconductor device 琳得科株式会社 2022-11-08 CN disclosed
CN-115210075-A Method for manufacturing sheet for manufacturing semiconductor device 琳得科株式会社 2022-10-18 CN disclosed
CN-114599755-A Sheet for manufacturing semiconductor device, method for manufacturing same, and method for manufacturing semiconductor chip with film-like adhesive 琳得科株式会社 2022-06-07 CN disclosed
CN-114586141-A Sheet for manufacturing semiconductor device 琳得科株式会社 2022-06-03 CN disclosed
CN-112566975-A Polypropylene composition with improved coatability 北欧化工公司 2021-03-26 CN disclosed
EP-1454937-A2 Epoxy resin curing agent, curable epoxy resin composition and cured products MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-09-08 EP disclosed
US-20040147715-A1 Epoxy resin curing agent, curable epoxy resin composition and cured product MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-29 US disclosed
US-6177541-B1 REACTING (A) TRIS-(2,3-EPOXYPROPYL) ISOCYANURATE CONTAINING FROM 10 TO 3,000 PPM OF HYDROLYZABLE CHLORINE AND (B) A CARBOXY ACID IN THE PRESENCE OF (C) AN ARYLPHOSPHINE AND/OR A PHOSPHONIUM SALT COMPRISING A NON-HALOGEN ANION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2001-01-23 US disclosed
US-4151313-A ACID AND ALKALI RESISTANCE HITACHI, LTD. (JP) 1979-04-24 US disclosed