SCHEMBL6569273

SCHEMBL6569273

Cc1c(F)c(F)cc(S(=O)(=O)[O-])c1F.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
KAT6A Q92794 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6748648 0.88 ALDH1A1 (0.32) TDP1
SCHEMBL4655839 0.84 TSHR (0.30)
SCHEMBL2957834 0.76 KAT6A (0.38) KAT6A
SCHEMBL4654810 0.75 ALDH1A1 (0.36) LMNATDP1
SCHEMBL2960432 0.75 POLB (0.38) TDP1KAT6A
SCHEMBL2537983 0.74 HTR2A (0.38)
SCHEMBL2954163 0.73 ALDH1A1 (0.36)
SCHEMBL1703497 0.73 TDP1 (0.37) LMNATDP1
SCHEMBL3204756 0.72 ALDH1A1 (0.35) KAT6A
SCHEMBL2966029 0.71 POLB (0.39) LMNAKAT6A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US claimed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP claimed