SCHEMBL6748648

SCHEMBL6748648

Cc1c(F)c(F)cc(S(=O)(=O)[O-])c1F.Cc1cc(C)c([S+](c2ccccc2)c2ccccc2)c(C)c1

nearest known ligand 0.32

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.32
POLB P06746 3/20 0.32
MAPT P10636 3/20 0.32
HPGD P15428 3/20 0.32
MEN1 O00255 2/20 0.32
NSD2 O96028 2/20 0.32
THRB P10828 2/20 0.32
MAPK1 P28482 2/20 0.32
RECQL P46063 2/20 0.32
P2RY1 P47900 2/20 0.32
KMT2A Q03164 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
NPSR1 Q6W5P4 2/20 0.32
TDP1 Q9NUW8 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
FFAR4 Q5NUL3 2/20 0.31
ALOX12 P18054 1/20 0.31
GFER P55789 1/20 0.31
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6569273 0.88 LMNA (0.31) TDP1
SCHEMBL4654631 0.84 ALDH1A1 (0.32) ALDH1A1POLBMAPTHPGDMEN1
SCHEMBL548239 0.81 MAPK1 (0.36) ALDH1A1POLBMAPTHPGDMEN1
SCHEMBL3139999 0.81 RAPGEF4 (0.35) MAPTMEN1MAPK1KMT2ASMN1; SMN2
SCHEMBL2512390 0.80 FFAR4 (0.36) ALDH1A1POLBMAPTHPGDMEN1
SCHEMBL3181557 0.80 PKM (0.34) MAPTMEN1MAPK1KMT2ASMN1; SMN2
SCHEMBL3190654 0.79 FFAR4 (0.47) MAPK1KMT2ASMN1; SMN2TDP1FFAR4
SCHEMBL58785 0.79 FFAR4 (0.46) ALDH1A1POLBMAPTMEN1KMT2A
SCHEMBL5066003 0.78 FFAR4 (0.41) ALDH1A1POLBMAPTHPGDSMN1; SMN2
SCHEMBL2512387 0.77 RAPGEF4 (0.45) ALDH1A1HPGDMAPK1RECQLSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed