SCHEMBL6570443

SCHEMBL6570443

O=C(Oc1ccc(S(=O)(=O)O)cc1)c1cccc(C(=O)Oc2ccc(S(=O)(=O)O)cc2)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.53
GAA P10253 1/20 0.53
KMT2A Q03164 3/20 0.48
PABPC1 P11940 1/20 0.48
EIF4H Q15056 1/20 0.48
CTDSP1 Q9GZU7 1/20 0.48
MAPT P10636 4/20 0.47
TDP1 Q9NUW8 3/20 0.47
SMN1; SMN2 Q16637 1/20 0.45
PRSS1 P07477 2/20 0.45
ACR P10323 2/20 0.45
PARP10 Q53GL7 1/20 0.45
MEN1 O00255 1/20 0.45
KDM4E B2RXH2 2/20 0.44
MAPK1 P28482 1/20 0.44
TCF4 P15884 1/20 0.43
CTNNB1 P35222 1/20 0.43
USP2 O75604 1/20 0.43
ALDH1A1 P00352 1/20 0.43
ALOX15 P16050 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2490813 0.88 PARP10 (0.59) KMT2AMAPTTDP1SMN1; SMN2PRSS1
SCHEMBL923659 0.86 PARP10 (0.57) KMT2AMAPTTDP1SMN1; SMN2PRSS1
SCHEMBL8898035 0.83 GAA (0.54) NPSR1GAAKMT2APABPC1EIF4H
SCHEMBL2673547 0.82 GAA (0.53) NPSR1GAAKMT2APABPC1EIF4H
SCHEMBL8899186 0.81 MAPT (0.67) KMT2AMAPTTDP1SMN1; SMN2PRSS1
SCHEMBL27992061 0.79 NSD2 (0.57) NPSR1GAAKMT2AMAPTTDP1
SCHEMBL14567085 0.79 LMNA (0.59) GAAKMT2AMAPTSMN1; SMN2PRSS1
SCHEMBL27722452 0.79 KMT2A (0.55) GAAKMT2ACTDSP1MAPTTDP1
SCHEMBL687865 0.78 KMT2A (0.56) KMT2AMAPTTDP1PARP10MEN1
SCHEMBL8848151 0.78 LMNA (0.56) GAAKMT2AMAPTTDP1PARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115243892-B Biaxially stretched polyamide film 东洋纺株式会社 2024-05-24 CN disclosed
CN-112805137-B Biaxially oriented polyamide film and rolled polyamide film roll 东洋纺株式会社 2022-11-29 CN disclosed
CN-115243892-A Biaxially stretched polyamide film 东洋纺株式会社 2022-10-25 CN disclosed
CN-110621750-B Aqueous coating composition and process for producing coated metal substrate 东洋制罐集团控股株式会社 2022-09-13 CN disclosed
WO-2022080469-A1 CROSSLINKED AROMATIC POLYESTER RESIN COMPOSITION AND PRODUCTION METHOD THEREFOR 東洋紡株式会社 2022-04-21 WO disclosed
WO-2021215498-A1 SEAMLESS CAN 東洋製罐グループホールディングス株式会社 (JP) 2021-10-28 WO disclosed
CN-112805137-A Biaxially oriented polyamide film and rolled polyamide film roll 东洋纺株式会社 2021-05-14 CN disclosed
WO-2021079670-A1 ADHESIVE COMPOSITION FOR FLEXIBLE PRINTED WIRING BOARD, ADHESIVE FOR FLEXIBLE PRINTED WIRING BOARD, AND FLEXIBLE PRINTED WIRING BOARD 三菱ケミカル株式会社 2021-04-29 WO disclosed
CN-110621750-A Aqueous coating composition and process for producing coated metal substrate 东洋制罐集团控股株式会社 2019-12-27 CN disclosed
US-20170307128-A1 VACUUM HEAT INSULATING MATERIAL TOYO SEIKAN GROUP HOLDINGS, LTD. (JP) 2017-10-26 US disclosed
EP-2832788-B1 GAS BARRIER MATERIAL AND GAS BARRIER LAMINATE TOYO SEIKAN GROUP HOLDINGS LTD (JP) 2017-08-30 EP disclosed
US-20160222234-A1 INK, INK CONTAINER, INKJET RECORDING DEVICE, AND RECORDED MATTER RICOH COMPANY, LTD. (JP) 2016-08-04 US disclosed
EP-2657017-A1 GAS BARRIER LAMINATE AND METHOD FOR PRODUCING SAME Toyo Seikan Group Holdings, Ltd. (JP) 2013-10-30 EP disclosed
EP-1111410-B1 Infrared absorption filter TOYO BOSEKI (JP) 2004-04-14 EP disclosed
US-20010005278-A1 Infrared absorption filter TOYO BOSEKI KABUSHIKI KAISHA (JP) 2001-06-28 US disclosed
EP-1111410-A2 Infrared absorption filter Toyo Boseki Kabushiki Kaisha (JP) 2001-06-27 EP disclosed
US-5912085-A OPTICAL RECORDING MATERIAL ON SUBSTRATES AND INKS TOYO BOSEKI KABUSHIKI KAISHA (JP) 1999-06-15 US disclosed
US-5837754-A Ink for ink jet printer TOYO BOSEKI KABUSHIKI KAISHA (JP) 1998-11-17 US disclosed