SCHEMBL65772

SCHEMBL65772

CC(=O)OCCN1CCOCC1

nearest known ligand 0.54

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.54
ALDH1A1 P00352 6/20 0.51
SMN1; SMN2 Q16637 2/20 0.50
LMNA P02545 1/20 0.50
KMT2A Q03164 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
KDM4E B2RXH2 2/20 0.49
SLC18A3 Q16572 1/20 0.49
TDP1 Q9NUW8 1/20 0.49
GLA P06280 1/20 0.48
GAA P10253 1/20 0.48
HPGD P15428 1/20 0.47
BCHE P06276 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14262617 0.92 ATM (0.48) ATMALDH1A1SMN1; SMN2LMNAKMT2A
SCHEMBL15095486 0.89 GAA (0.52) ATMALDH1A1SMN1; SMN2LMNAKDM4E
SCHEMBL65505 0.88 ALDH1A1 (0.52) ATMALDH1A1SMN1; SMN2LMNAKMT2A
SCHEMBL17696813 0.87 KDM4E (0.49) ALDH1A1SMN1; SMN2LMNAKMT2AKDM4E
SCHEMBL20609092 0.86 SLC18A3 (0.56) ATMALDH1A1SMN1; SMN2LMNAKMT2A
SCHEMBL9328257 0.86
SCHEMBL65208 0.84 ALDH1A1 (0.53) ALDH1A1SMN1; SMN2LMNAKMT2AKDM4E
SCHEMBL166860 0.84 ATM (0.57) ATMALDH1A1SMN1; SMN2LMNAKMT2A
SCHEMBL23519107 0.83 SLC18A3 (0.43) ATMALDH1A1SMN1; SMN2LMNAKMT2A
SCHEMBL166861 0.82 ALDH1A1 (0.56) ATMALDH1A1SMN1; SMN2LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1020 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231227-A1 OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2024-07-11 US claimed
CN-117440944-A Oxothiazonium ion-containing sulfonic acid derivative compounds as photoacid generators in resist applications 贺利氏电子化学品有限公司 2024-01-23 CN claimed
WO-2022272226-A1 OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC (US) 2022-12-29 WO claimed
US-9709886-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2017-07-18 US claimed
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2017-01-05 US claimed
CN-103930396-B Anil, its preparation and treatment use thereof 赛诺菲 2016-11-16 CN claimed
CN-103930396-A Aniline derivatives,their preparation and their therapeutic application FOVEA PHARMACEUTICALS 2014-07-16 CN claimed
CN-102149385-A Compound (I) GLAXOSMITHKLINE LLC 2011-08-10 CN claimed
CN-101534832-A Substituted nitrogen containing heterocycles as platelet ADP receptor inhibitors PORTOLA PHARM INC (US) 2009-09-16 CN claimed
EP-1264212-B1 ELEMENTS FOR FORMING PRINT-OUT IMAGES DU PONT (US) 2009-02-18 EP claimed
US-6869755-B2 Elements for forming print-out images E. I. DU PONT DE NEMOURS AND COMPANY (US) 2005-03-22 US claimed
EP-1264212-A2 ELEMENTS FOR FORMING PRINT-OUT IMAGES E. I. du Pont de Nemours and Company (US) 2002-12-11 EP claimed
US-20020146649-A1 Elements for forming print-out images E. I. DU PONT DE NEMOURS AND COMPANY 2002-10-10 US claimed
WO-2001067175-A2 ELEMENTS FOR FORMING PRINT-OUT IMAGES E. I. DU PONT DE NEMOURS AND COMPANY (US) 2001-09-13 WO claimed
CN-122037094-A Block copolymer having cleavable main chain, photoresist composition comprising the same, and pattern forming method 杜邦电子材料国际有限责任公司 2026-05-15 CN disclosed
WO-2026101739-A1 CYCLIC SULFONATE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC (US) 2026-05-15 WO disclosed
US-20260132241-A1 MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) 2026-05-14 US disclosed
US-20020061463-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-23 US disclosed
EP-1195390-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-10 EP disclosed
WO-2001067175-A2 ELEMENTS FOR FORMING PRINT-OUT IMAGES E. I. DU PONT DE NEMOURS AND COMPANY (US) 2001-09-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260132241-A1 MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS DCLRE1A, CD79B, RAD1 ATM 2894/4885ALDH1A1 2959/4885SMN1; SMN2 3876/4885
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS ALAD, MPST, ASIC1 ATM 1764/4885ALDH1A1 1257/4885SMN1; SMN2 3836/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.