SCHEMBL661635

SCHEMBL661635

CO[Si](CCCCCC1CO1)(OC)OC

nearest known ligand 0.52

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.52
EPHX1 P07099 1/20 0.35
LMNA P02545 1/20 0.35
TDP1 Q9NUW8 1/20 0.32
SPHK1 Q9NYA1 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.31
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22406184 1.00 ALDH1A1 (0.52) ALDH1A1EPHX1LMNATDP1SPHK1
SCHEMBL662003 1.00 ALDH1A1 (0.52) ALDH1A1EPHX1LMNATDP1SPHK1
SCHEMBL1305999 1.00 ALDH1A1 (0.52) ALDH1A1EPHX1LMNATDP1SPHK1
SCHEMBL3054646 1.00 ALDH1A1 (0.52) ALDH1A1EPHX1LMNATDP1SPHK1
SCHEMBL9417181 1.00 ALDH1A1 (0.52) ALDH1A1EPHX1LMNATDP1SPHK1
SCHEMBL9615523 1.00 ALDH1A1 (0.52) ALDH1A1EPHX1LMNATDP1SPHK1
SCHEMBL238324 0.98 ALDH1A1 (0.48) ALDH1A1EPHX1LMNASMN1; SMN2TSHR
Methane SCHEMBL19742310 0.96 ALDH1A1 (0.47) ALDH1A1EPHX1LMNASMN1; SMN2TSHR
Water SCHEMBL28003929 0.96 ALDH1A1 (0.47) ALDH1A1EPHX1LMNASMN1; SMN2TSHR
SCHEMBL659457 0.92 ALDH1A1 (0.48) ALDH1A1EPHX1LMNATDP1SPHK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 409 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9428654-B2 Dew resistant coatings AVERY DENNISON CORPORATION (US) 2016-08-30 US claimed
CN-102660195-B Surface modified nano-abrasive silicon slice polishing liquid CHANGSHU AOSHOU PHOTOELECTRIC MATERIALS CO LTD 2014-04-02 CN claimed
CN-102660195-A Surface modified nano-abrasive silicon slice polishing liquid CHANGSHU AOSHOU PHOTOELECTRIC MATERIALS CO LTD 2012-09-12 CN claimed
US-20090252956-A1 DEW RESISTANT COATINGS AVERY DENNISON CORPORATION (US) 2009-10-08 US claimed
US-7504156-B2 Dew resistant coatings AVERY DENNISON CORPORATION (US) 2009-03-17 US claimed
WO-2005103172-A2 DEW RESISTANT COATINGS AVERY DENNISON CORPORATION (US) 2005-11-03 WO claimed
US-20050233135-A1 Dew resistant coatings AVERY DENNISON CORPORATION 2005-10-20 US claimed
US-20260121015-A1 METHODS FOR MAKING SOLID-STATE LITHIUM-ION BATTERIES GRAPHENIX DEVELOPMENT, INC. (US) 2026-04-30 US disclosed
US-20260112683-A1 SOLID-STATE LITHIUM-ION BATTERIES AND METHODS OF MAKING SAME GRAPHENIX DEVELOPMENT, INC. (US) 2026-04-23 US disclosed
US-20260092165-A1 SURFACE-TREATED SPHERICAL SILICA AND METHOD FOR PRODUCING SURFACE-TREATED SPHERICAL SILICA AGC Inc. (JP) 2026-04-02 US disclosed
US-20260091982-A1 SURFACE-TREATED HOLLOW SILICA AND METHOD FOR PRODUCING SURFACE-TREATED HOLLOW SILICA AGC Inc. (JP) 2026-04-02 US disclosed
US-20260070795-A1 SPHERICAL SILICA POWDER AND METHOD FOR PRODUCING SPHERICAL SILICA POWDER AGC Inc. (JP) 2026-03-12 US disclosed
EP-4706122-A1 SILICON-CONTAINING LITHIUM-ION BATTERIES Graphenix Development, Inc. (US) 2026-03-11 EP disclosed
CN-1257531-A Composition for providing an abrasion resistant coating on a substrate SDC COATINGS INC (US) 2000-06-21 CN disclosed
CN-1053170-C Process for a surface treatment of a glass fabric MATSUSHITA ELECTRIC WORKS LTD (JP) 2000-06-07 CN disclosed
WO-2000024831-A1 COMPOSITION FOR PROVIDING AN ABRASION RESISTANT COATING ON A SUBSTRATE HAVING IMPROVED ADHESION AND IMPROVED RESISTANCE TO CRACK FORMATION SDC COATINGS, INC. (US) 2000-05-04 WO disclosed
US-6001163-A Composition for providing an abrasion resistant coating on a substrate SDC COATINGS, INC. (US) 1999-12-14 US disclosed
US-5958514-A Composition for providing an abrasion resistant coating on a substrate SDC COATINGS, INC. (US) 1999-09-28 US disclosed
US-5585147-A PLASMA ACTIVATION; COUPLING WITH AN ORGANOSILANE COMPOUND MATSUSHITA ELECTRIC WORKS, LTD. (JP) 1996-12-17 US disclosed
CN-1121055-A Process for a surface treatment of a glass fabric MATSUSHITA ELECTRIC WORKS LTD (JP) 1996-04-24 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260112683-A1 SOLID-STATE LITHIUM-ION BATTERIES AND METHODS OF MAKING SAME ILK, NES, GSK3B ALDH1A1 2896/4885EPHX1 4474/4885LMNA 1329/4885
US-20260070795-A1 SPHERICAL SILICA POWDER AND METHOD FOR PRODUCING SPHERICAL SILICA POWDER SIK1, SIK2, SIK3 ALDH1A1 4240/4885EPHX1 4859/4885LMNA 1960/4885
US-20260121015-A1 METHODS FOR MAKING SOLID-STATE LITHIUM-ION BATTERIES CACNA1S, CACNA2D1, CACNA1D ALDH1A1 2406/4885EPHX1 3597/4885LMNA 249/4885
US-20260091982-A1 SURFACE-TREATED HOLLOW SILICA AND METHOD FOR PRODUCING SURFACE-TREATED HOLLOW SILICA SMC4, TMPO, KDM4B ALDH1A1 4098/4885EPHX1 2726/4885LMNA 2944/4885
US-20260092165-A1 SURFACE-TREATED SPHERICAL SILICA AND METHOD FOR PRODUCING SURFACE-TREATED SPHERICAL SILICA SMC4, SMARCA4, SMC2 ALDH1A1 4432/4885EPHX1 3578/4885LMNA 2364/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.