SCHEMBL6653828

SCHEMBL6653828

C[S+]1c2ccccc2Sc2ccccc21

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 2/20 0.41
NOX1 Q9Y5S8 3/20 0.39
BCHE P06276 10/20 0.39
PTGS1 P23219 3/20 0.39
PTGS2 P35354 3/20 0.39
SLC6A2 P23975 3/20 0.39
POLB P06746 2/20 0.39
ACHE P22303 2/20 0.39
MEN1 O00255 2/20 0.39
ADORA3 P0DMS8 2/20 0.39
HTR2C P28335 2/20 0.39
SLC6A3 Q01959 2/20 0.39
KMT2A Q03164 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
GAA P10253 1/20 0.39
MAPT P10636 1/20 0.39
ALOX15 P16050 1/20 0.39
ALOX12 P18054 1/20 0.39
CNR1 P21554 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30787915 0.91 MAOA (0.35) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL5074727 0.78
SCHEMBL29449827 0.74 BCHE (0.39) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL1144620 0.74 BCHE (0.39) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL12411043 0.73 MAOA (0.37) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL30767920 0.72 ACHE (0.38) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL3287499 0.72 ACHE (0.38) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL30278969 0.70 BCHE (0.36) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL683041 0.70 BCHE (0.36) MAOANOX1BCHEPTGS1PTGS2
SCHEMBL21629348 0.69 BCHE (0.56) MAOANOX1BCHEPTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240240066-A1 REACTIVE ADHESIVE TAPE THAT CAN BE STAMPED TESA SE (DE) 2024-07-18 US disclosed
US-20240210830-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-06-27 US disclosed
US-11914294-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed
US-11914291-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027903-A1 Resist Material And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027909-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11860540-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-02 US disclosed
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
US-11835860-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-7671081-B2 Multifunctional cationic photoinitiators, their preparation and use SUN CHEMICAL CORPORATION (US) 2010-03-02 US disclosed
US-7598401-B2 Multifunctional cationic photoinitiators, their preparation and use SUN CHEMICAL CORPORATION (US) 2009-10-06 US disclosed
US-20090023829-A1 MULTIFUNCTIONAL CATIONIC PHOTOINITIATORS, THEIR PREPARATION AND USE SUN CHEMICAL CORPORATION (US) 2009-01-22 US disclosed
US-7405308-B2 Thianthrenium salt cationic photoinitiators RENSSELAER POLYTECHNIC INSTITUE (US) 2008-07-29 US disclosed
US-20080081917-A1 MULTIFUNCTIONAL CATIONIC PHOTOINITIATORS, THEIR PREPARATION AND USE SUN CHEMICAL CORPORATION (US) 2008-04-03 US disclosed
US-7294723-B2 Multifunctional cationic photoinitiators, their preparation and use SUN CHEMICAL CORPORATION (US) 2007-11-13 US disclosed
EP-0931103-B1 MONOMERS, OLIGOMERS AND POLYMERS WITH TERMINAL OXIRANE GROUPS, METHOD OF PREPARATION AND POLYMERISATION UNDER RADIATION EXPOSURE UCB SA (BE) 2004-06-09 EP disclosed
US-6417243-B1 POLYESTERURETHANE BLOCKS UCB, S.A. (BE) 2002-07-09 US disclosed
EP-0931103-A1 MONOMERS, OLIGOMERS AND POLYMERS WITH TERMINAL OXIRANE GROUPS, METHOD OF PREPARATION AND POLYMERISATION UNDER RADIATION EXPOSURE UCB, S.A. (BE) 1999-07-28 EP disclosed
WO-1998014497-A1 MONOMERS, OLIGOMERS AND POLYMERS WITH TERMINAL OXIRANE GROUPS, METHOD OF PREPARATION AND POLYMERISATION UNDER RADIATION EXPOSURE UCB, S.A. (BE) 1998-04-09 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240027903-A1 Resist Material And Patterning Process LBR, HNRNPU, EWSR1 MAOA 4155/4885NOX1 4596/4885BCHE 3482/4885
US-20080081917-A1 MULTIFUNCTIONAL CATIONIC PHOTOINITIATORS, THEIR PREPARATION AND USE CNKSR1, YWHAZ, YWHAH MAOA 774/4885NOX1 18/4885BCHE 1423/4885
US-20090023829-A1 MULTIFUNCTIONAL CATIONIC PHOTOINITIATORS, THEIR PREPARATION AND USE YWHAZ, PYM1, CNKSR1 MAOA 821/4885NOX1 10/4885BCHE 1712/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.