SCHEMBL6660069

SCHEMBL6660069

CC(C)(C)OC(=O)c1ccc(OCc2ccccc2)c(C(=O)OC(C)(C)C)c1OCc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
CA9 Q16790 1/20 0.43
FFAR4 Q5NUL3 1/20 0.43
PTPN1 P18031 1/20 0.43
LMNA P02545 1/20 0.43
HPGD P15428 1/20 0.43
FOLH1 Q04609 2/20 0.42
HTT P42858 1/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
RXRG P48443 1/20 0.41
BRD4 O60885 1/20 0.41
KDM4E B2RXH2 1/20 0.41
ALDH1A1 P00352 1/20 0.41
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23413883 0.81 SMPD1 (0.44) SMN1; SMN2CA9FFAR4LMNAHPGD
SCHEMBL23413759 0.80 MAOB (0.53) MAPTTDP1L3MBTL1LMNAHPGD
SCHEMBL23414364 0.80 TDP1 (0.45) MAPTCYP2C9CYP2C19SMN1; SMN2TDP1
SCHEMBL12980387 0.78 PTGER1 (0.54) CYP2C9KDM4E
SCHEMBL28295384 0.78 RXRA (0.52) SMN1; SMN2HPGDRXRARXRBRXRG
SCHEMBL19511860 0.77 PTGER1 (0.49) MAPTCYP2C9CYP2C19SMN1; SMN2TDP1
SCHEMBL1185406 0.77 LMNA (0.41) LMNAHPGDALDH1A1POLB
SCHEMBL8523314 0.77 POLB (0.46) CYP2C9CA9FFAR4HPGDFOLH1
SCHEMBL12980377 0.77 MAOB (0.55) MAPTCYP2C9CYP2C19SMN1; SMN2TDP1
SCHEMBL1185563 0.77 ALDH1A1 (0.54) MAPTCYP2C9CYP2C19SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0814109-B1 Photosensitive polyimide precursor and its use for pattern formation HITACHI CHEMICAL CO LTD (JP) 2004-08-18 EP disclosed
US-20020048726-A1 Photosensitive polyimide precursor and its use for pattern formation HITACHI CHEMICAL COMPANY, LTD. (JP) 2002-04-25 US disclosed
US-6319656-B1 FORMING FILM OF A NEGATIVE-WORKING PHOTO-SENSITIVE POLYIMIDE PRECURSOR ON A SUBSTRATE; EXPOSING FILM TO LIGHT THROUGH A MASK HAVING A PREDETERMINED PATTERN; DEVELOPING THE EXPOSED FILM USING AN ALKALINE AQUEOUS SOLUTION HITACHI CHEMICAL COMPANY, LTD. (JP) 2001-11-20 US disclosed
US-6025113-A FOR PREPARING HIGHLY SENSITIVE NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL DEVELOPABLE WITH ALKALINE AQUEOUS SOLUTION IN SHORT TIME WITH HIGH RESOLUTION HITACHI CHEMICAL COMPANY, LTD. (JP) 2000-02-15 US disclosed
EP-0814109-A1 Photosensitive polyimide precursor and its use for pattern formation HITACHI CHEMICAL COMPANY, LTD. (JP) 1997-12-29 EP disclosed