SCHEMBL6663432

SCHEMBL6663432

CC(C)N(CCCN(C(C)C)C(C)C)C(C)C

nearest known ligand 0.56

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.56
KMT2A Q03164 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL6659569 0.93 MEN1 (0.50) MEN1KMT2A
SCHEMBL1314528 0.92 MEN1 (0.56) MEN1KMT2A
SCHEMBL29930548 0.90 MEN1 (0.48) MEN1KMT2A
SCHEMBL19543058 0.87 MEN1 (0.46) MEN1KMT2A
SCHEMBL26267235 0.87 MEN1 (0.46) MEN1KMT2A
SCHEMBL633999 0.87 ALDH1A1 (0.47) MEN1KMT2A
SCHEMBL26267263 0.87 MEN1 (0.46) MEN1KMT2A
SCHEMBL26267266 0.85 MEN1 (0.43) MEN1KMT2A
SCHEMBL26267251 0.85 MEN1 (0.43) MEN1KMT2A
SCHEMBL6658248 0.85 MEN1 (0.43) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2605069-B1 RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME MERCK PATENT GMBH (DE) 2021-09-22 EP claimed
EP-3208659-A1 COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2017-08-23 EP claimed
US-20170219927-A1 COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME AZ ELECTRIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2017-08-03 US claimed
US-20130164694-A1 RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-06-27 US claimed
EP-2605069-A1 RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME AZ Electronic Materials USA Corp. (US) 2013-06-19 EP claimed
US-12372875-B2 Composition for resist pattern metallization process NISSAN CHEMICAL CORPORATION (JP) 2025-07-29 US disclosed
US-20250206901-A1 BRUSH MATERIAL FOR SELF-ASSEMBLED FILM NISSAN CHEMICAL CORPORATION (JP) 2025-06-26 US disclosed
US-20240036469-A1 METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE MERCK ELECTRONICS LTD. (JP) 2024-02-01 US disclosed
EP-4264376-A1 METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE Merck Patent GmbH (DE) 2023-10-25 EP disclosed
WO-2023190807-A1 BRUSH MATERIAL FOR SELF-ASSEMBLED FILM 日産化学株式会社 2023-10-05 WO disclosed
US-11771715-B2 Circular RNA compositions and methods ORNA THERAPEUTICS, INC. (US) 2023-10-03 US disclosed
US-11766449-B2 Circular RNA compositions and methods ORNA THERAPEUTICS, INC. (US) 2023-09-26 US disclosed
US-20100080926-A1 INK COMPOSITION AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
EP-2169018-A2 Ink composition and inkjet recording method Fujifilm Corporation (JP) 2010-03-31 EP disclosed
EP-2169022-A1 Ink composition and inkjet recording method Fujifilm Corporation (JP) 2010-03-31 EP disclosed
EP-1160267-B1 CATALYST FOR OXIDATIVE POLYMERIZATION OF FLUOROPHENOL, METHOD OF OXIDATIVE POLYMERIZATION OF FLUOROPHENOL, AND POLY(OXYFLUOROPHENYLENE) DERIVATIVE JAPAN SCIENCE & TECH CORP (JP) 2004-08-04 EP disclosed
US-6689919-B1 SOLUBLE POLY(OXYFLUOROPHENYLENE) COMPOUNDS WITH EXCELLENT HEAT RESISTANCE, MEMBRANE-FORMABILITY AND CHEMICAL STABILITY JAPAN SCIENCE AND TECHNOLOGY CORPORATION (JP) 2004-02-10 US disclosed
EP-0424171-B1 Perfluoro-N,N,N',N'-tetrapropyldiaminopropane and use thereof in vapor phase heating MINNESOTA MINING & MFG (US) 1993-12-29 EP disclosed
US-5104034-A PERFLUORO-N,N,N',N-TETRAPROPYLDIAMINOPROPANE AND USE THEREOF IN VAPOR PHASE HEATING MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-04-14 US disclosed
EP-0424171-A2 Perfluoro-N,N,N',N'-tetrapropyldiaminopropane and use thereof in vapor phase heating MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-04-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11771715-B2 Circular RNA compositions and methods RTCB, HNRNPA1, HNRNPAB MEN1 3812/4885KMT2A 4184/4885
US-11766449-B2 Circular RNA compositions and methods RTCB, RNGTT, HNRNPAB MEN1 4026/4885KMT2A 3946/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.