Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6663432 | 0.92 | MEN1 (0.56) | MEN1KMT2A | |
| SCHEMBL25849562 | 0.87 | ALDH1A1 (0.56) | MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL19543089 | 0.87 | MEN1 (0.46) | MEN1KMT2A | |
| SCHEMBL504335 | 0.87 | DNM1 (0.46) | MEN1KMT2ATSHR | |
| Bromide SCHEMBL6659569 | 0.86 | MEN1 (0.50) | MEN1KMT2A | |
| SCHEMBL12791152 | 0.85 | DNM1 (0.50) | MEN1KMT2ATSHR | |
| SCHEMBL7470945 | 0.85 | MEN1 (0.43) | MEN1KMT2A | |
| SCHEMBL9398013 | 0.85 | DNM1 (0.50) | MEN1KMT2ATSHR | |
| SCHEMBL20746956 | 0.85 | DNM1 (0.50) | MEN1KMT2ATSHR | |
| SCHEMBL21126455 | 0.85 | DNM1 (0.50) | MEN1KMT2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2605069-B1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME | MERCK PATENT GMBH (DE) | 2021-09-22 | — | — | EP | claimed |
| EP-3208659-A1 | COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2017-08-23 | — | — | EP | claimed |
| US-20170219927-A1 | COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME | AZ ELECTRIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-08-03 | — | — | US | claimed |
| US-20130164694-A1 | RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-27 | — | — | US | claimed |
| EP-2605069-A1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME | AZ Electronic Materials USA Corp. (US) | 2013-06-19 | — | — | EP | claimed |
| US-12372875-B2 | Composition for resist pattern metallization process | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-20240036469-A1 | METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE | MERCK ELECTRONICS LTD. (JP) | 2024-02-01 | — | — | US | disclosed |
| EP-4264376-A1 | METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE | Merck Patent GmbH (DE) | 2023-10-25 | — | — | EP | disclosed |
| US-11531269-B2 | Method for producing resist pattern coating composition with use of solvent replacement method | NISSAN CHEMICAL CORPORATION (JP) | 2022-12-20 | — | — | US | disclosed |
| US-20220206395-A1 | COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| WO-2022129015-A1 | METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE | MERCK PATENT GMBH (DE) | 2022-06-23 | — | — | WO | disclosed |
| EP-2605069-B1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME | MERCK PATENT GMBH (DE) | 2021-09-22 | — | — | EP | disclosed |
| US-20120270859-A1 | INDOLINE DERIVATIVES AND THEIR USE IN TREATING DISEASE-STATES SUCH AS CANCER | BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) | 2012-10-25 | — | — | US | disclosed |
| US-20110275633-A1 | 2,4-DIAMINOPYRIMIDINE DERIVATES AS PTK2- INHIBITORS FOR THE TREATMENT OF ABNORMAL CELL GROWTH | BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) | 2011-11-10 | — | — | US | disclosed |
| EP-2350084-A1 | TETRA-AZA-HETEROCYCLES AS PHOSPHATIDYLINOSITOL-3-KINASES (PI3-KINASES) INHIBITOR | Boehringer Ingelheim International GmbH (DE) | 2011-08-03 | — | — | EP | disclosed |
| WO-2010043676-A1 | TETRA-AZA-HETEROCYCLES AS PHOSPHATIDYLINOSITOL-3-KINASES (PI3-KINASES) INHIBITOR | BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) | 2010-04-22 | — | — | WO | disclosed |
| EP-2176249-A2 | NEW CHEMICAL COMPOUNDS | Boehringer Ingelheim International GmbH (DE) | 2010-04-21 | — | — | EP | disclosed |
| EP-2170884-A2 | CHEMICAL COMPOUNDS | Boehringer Ingelheim International GmbH (DE) | 2010-04-07 | — | — | EP | disclosed |
| WO-2009003998-A2 | ANTIPROLIFERATIVE COMPOUNDS BASED ON 5-MEMBERED HETEROCYCLES | BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) | 2009-01-08 | — | — | WO | disclosed |
| WO-2009000832-A2 | CHEMICAL COMPOUNDS | BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) | 2008-12-31 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120270859-A1 | INDOLINE DERIVATIVES AND THEIR USE IN TREATING DISEASE-STATES SUCH AS CANCER | IDO1, INMT, TPH1 | MEN1 192/4885KMT2A 1367/4885ALDH1A1 243/4885 |
| US-20110275633-A1 | 2,4-DIAMINOPYRIMIDINE DERIVATES AS PTK2- INHIBITORS FOR THE TREATMENT OF ABNORMAL CELL GROWTH | PTK2B, CDK2, PTK2 | MEN1 975/4885KMT2A 1139/4885ALDH1A1 1870/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.