SCHEMBL6674723

SCHEMBL6674723

C=CC(=O)OC(C)(C)CCC(C)(C)OC(=O)C=C.C=Cc1ccc(OC(=O)OC(C)(C)Cc2ccc(C=CO)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 3/20 0.38
HIF1A Q16665 2/20 0.37
EPAS1 Q99814 2/20 0.37
ELANE P08246 1/20 0.32
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
KMT2A Q03164 3/20 0.31
THRA P10827 1/20 0.31
MEN1 O00255 1/20 0.31
MAPT P10636 1/20 0.31
CTSK P43235 1/20 0.31
NFKB1 P19838 2/20 0.30
NFKB2 Q00653 1/20 0.30
RELA Q04206 1/20 0.30
CYP24A1 Q07973 1/20 0.30
CYP3A4 P08684 2/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2495650 0.92 HIF1A (0.37) THRBHIF1AEPAS1ELANEHDAC3
SCHEMBL7728391 0.81 PPARA (0.37) THRBHIF1AEPAS1HDAC3HDAC1
4-Vinylphenol SCHEMBL6674720 0.78 ELANE (0.44) THRBHIF1AEPAS1ELANEKMT2A
SCHEMBL5927563 0.76 THRA (0.40) THRBHDAC3HDAC1HDAC2HDAC8
SCHEMBL6551673 0.75 PPARG (0.35) ELANEHDAC3HDAC1HDAC2HDAC8
SCHEMBL6552052 0.74 CYP3A4 (0.35) ELANEHDAC3HDAC1HDAC2HDAC8
SCHEMBL6864307 0.74 CTSK (0.35) THRBHIF1AEPAS1ELANEKMT2A
SCHEMBL9777199 0.73 THRB (0.42) THRBHIF1AEPAS1ELANEKMT2A
SCHEMBL5454889 0.73 CTSK (0.36) ELANEHDAC3HDAC1HDAC2HDAC8
SCHEMBL6271933 0.72 ELANE (0.44) THRBHIF1AEPAS1ELANEKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0901043-B1 Radiation-sensitive resin composition JSR CORP (JP) 2004-10-27 EP disclosed
US-6120972-A COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS JSR CORPORATION (JP) 2000-09-19 US disclosed
EP-0901043-A1 Radiation-sensitive resin composition JSR Corporation (JP) 1999-03-10 EP disclosed