Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.37 |
| ▸ | ELANE | P08246 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | CYP24A1 | Q07973 | 1/20 | 0.34 |
| ▸ | CTSK | P43235 | 1/20 | 0.34 |
| ▸ | PPARG | P37231 | 3/20 | 0.34 |
| ▸ | PPARA | Q07869 | 3/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.34 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.34 |
| ▸ | THRA | P10827 | 1/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.33 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6674723 | 0.92 | THRB (0.38) | HIF1AEPAS1ELANETHRBCYP3A4 | |
| SCHEMBL5927563 | 0.82 | THRA (0.40) | THRBCYP3A4CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL6551673 | 0.82 | PPARG (0.35) | ELANECYP3A4CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL6552052 | 0.81 | CYP3A4 (0.35) | ELANECYP3A4CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL6864307 | 0.81 | CTSK (0.35) | HIF1AEPAS1ELANETHRBCYP3A4 | |
| SCHEMBL5454889 | 0.80 | CTSK (0.36) | ELANECYP3A4CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL7728391 | 0.79 | PPARA (0.37) | HIF1AEPAS1THRBCTSKPPARG | |
| SCHEMBL6271933 | 0.79 | ELANE (0.44) | HIF1AEPAS1ELANETHRBCYP3A4 | |
| SCHEMBL3838403 | 0.79 | CYP3A4 (0.33) | ELANECYP3A4CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL4968047 | 0.78 | CTSK (0.33) | ELANECYP3A4CYP1A2CYP2D6CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2370859-A2 | A PHOTOSENSITIVE COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2011-10-05 | — | — | EP | disclosed |
| WO-2010064135-A2 | A PHOTOSENSITIVE COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-06-10 | — | — | WO | disclosed |
| US-20100136477-A1 | Photosensitive Composition | AZ ELECTRONIC MATERIALS USA CORP. | 2010-06-03 | — | — | US | disclosed |
| EP-2111567-A2 | PHOTORESIST COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2009-10-28 | — | — | EP | disclosed |
| WO-2008096263-A2 | PHOTORESIST COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-14 | — | — | WO | disclosed |
| US-20080187868-A1 | Photoactive Compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2008-08-07 | — | — | US | disclosed |
| US-20010049071-A1 | HIGHLY SENSITIVE POSITIVE PHOTORESIST COMPOSITIONS | DAVID PAUL MERRITT | 2001-12-06 | — | — | US | disclosed |
| EP-0366590-B2 | Highly sensitive positive photoresist compositions | IBM (US) | 2001-03-21 | — | — | EP | disclosed |
| US-6156476-A | Positive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-05 | — | — | US | disclosed |
| EP-0607899-B1 | Positive photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2000-06-14 | — | — | EP | disclosed |
| US-6051659-A | DISSOLVING A POLYMER HAVING ACID LABILE GROUPS PENDENT TO THE POLYMER BACKBONE IN AN ACID STABLE SOLVENT, HEATING WITH STIRRING, ADDING CONCENTRATED MINERAL ACID TO REMOVE ACID LABILE GROUP FROM POLYMER, QUENCHING AND PRECIPITATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-04-18 | — | — | US | disclosed |
| EP-0366590-B1 | Highly sensitive positive photoresist compositions | IBM (US) | 1996-03-20 | — | — | EP | disclosed |
| EP-0607899-A2 | Positive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-07-27 | — | — | EP | disclosed |
| EP-0556177-A1 | TOP COAT FOR ACID CATALYZED RESISTS | International Business Machines Corporation (US) | 1993-08-25 | — | — | EP | disclosed |
| WO-1992005474-A1 | TOP COAT FOR ACID CATALYZED RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1992-04-02 | — | — | WO | disclosed |
| EP-0366590-A2 | Highly sensitive positive photoresist compositions | International Business Machines Corporation (US) | 1990-05-02 | — | — | EP | disclosed |