SCHEMBL6677569

SCHEMBL6677569

CN(C)c1ccccc1N=Nc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.60
CYP2D6 P10635 1/20 0.60
MEN1 O00255 3/20 0.52
KMT2A Q03164 3/20 0.52
MAPT P10636 1/20 0.52
MAPK1 P28482 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
RPS6KA3 P51812 1/20 0.51
ATIC P31939 1/20 0.45
MYC P01106 1/20 0.44
GLO1 Q04760 1/20 0.44
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
CA12 O43570 2/20 0.43
CA2 P00918 2/20 0.43
CA9 Q16790 2/20 0.43
ALPL P05186 1/20 0.42
ALPI P09923 1/20 0.42
ALPG P10696 1/20 0.42
PHLPP2 Q6ZVD8 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9788043 0.98 POLB (0.58) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL6810312 0.85 MEN1 (0.52) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL16322731 0.85 MEN1 (0.71) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL4436535 0.85 MEN1 (0.52) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL42642 0.85 CA2 (0.62) POLBMEN1KMT2AMAPTMAPK1
SCHEMBL16566766 0.84 POLB (0.55) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL16566903 0.82 POLB (0.53) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL5485815 0.81 HTR6 (0.47) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL29747008 0.80 MAPK1 (0.53) POLBCYP2D6MEN1KMT2AMAPT
SCHEMBL16566852 0.80 POLB (0.50) POLBCYP2D6MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2017161407-A1 OXIDANT SENSOR UNIVERSITY OF SOUTH AUSTRALIA (AU) 2017-09-28 WO claimed
EP-2851094-B1 DISINFECTION AND CLEANING CONFIRMATION SYSTEM METREX RES LLC (US) 2020-12-02 EP disclosed
EP-2948521-A1 A SOLID PARTICLES-STABILIZED EMULSION AND PROCESS FOR PREPARING THE SAME Wintershall Holding GmbH (DE) 2015-12-02 EP disclosed
US-9170205-B2 Disinfection and cleaning confirmation system Metrex Research, LLC (US) 2015-10-27 US disclosed
EP-2851094-A1 Disinfection and cleaning confirmation system Metrex Research LLC (US) 2015-03-25 EP disclosed
CN-104458713-A Disinfection and cleaning confirmation system METREX RES LLC 2015-03-25 CN disclosed
US-20150079690-A1 DISINFECTION AND CLEANING CONFIRMATION SYSTEM Metrex Research, LLC (US) 2015-03-19 US disclosed
WO-2014114537-A1 A SOLID PARTICLES-STABILIZED EMULSION AND PROCESS FOR PREPARING THE SAME Wintershall Holding GmbH (DE) 2014-07-31 WO disclosed
US-6811961-B2 PHOTORESIST RELEIF IMAGES; MIXTURE OF RESIN AND ACID GENERATORS SHIPLEY COMPANY, L.L.C. 2004-11-02 US disclosed
WO-2002069039-A9 PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING SHIPLEY CO LLC (US) 2004-05-06 WO disclosed
US-6664022-B1 Forming relief image on substrate by coating with amplified positive resin and iodinium or sulfonium compound comprising naphthyl, thienyl or pentafluorophenyl substituents; exposure to patterned activating radiation; development SHIPLEY COMPANY, L.L.C. 2003-12-16 US disclosed
US-20030013049-A1 Photoacid generator systems for short wavelength imaging SHIPLEY COMPANY, L.L.C. 2003-01-16 US disclosed
WO-2002069039-A2 PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING SHIPLEY COMPANY, L.L.C. (US) 2002-09-06 WO disclosed
WO-2002019033-A2 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY COMPANY, L.L.C. (US) 2002-03-07 WO disclosed