SCHEMBL6684870

SCHEMBL6684870

CCCCOC1(OCCCC)CCCN1C

nearest known ligand 0.33

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.33
TSHR P16473 1/20 0.30
ALDH1A1 P00352 1/20 0.30
CYP1A2 P05177 1/20 0.30
CHRM2 P08172 1/20 0.30
CHRM1 P11229 1/20 0.30
HTR2A P28223 1/20 0.30
MAPK1 P28482 1/20 0.30
SCN1A P35498 1/20 0.30
HTR2B P41595 1/20 0.30
KCNH2 Q12809 1/20 0.30
SCN2A Q99250 1/20 0.30
SIGMAR1 Q99720 1/20 0.30
SCN3A Q9NY46 1/20 0.30
HRH3 Q9Y5N1 1/20 0.30
GRIN1 Q05586 1/20 0.30
GRIN2A Q12879 1/20 0.30
GRIN2B Q13224 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6685764 0.88 OPRM1 (0.30)
SCHEMBL6762569 0.83
SCHEMBL5585758 0.82
SCHEMBL5586077 0.79
SCHEMBL3843792 0.79 LTA4H (0.33) LTA4H
SCHEMBL5585718 0.75 OPRM1 (0.32)
SCHEMBL5586062 0.74 LTA4H (0.36) LTA4HTSHRALDH1A1CYP1A2CHRM2
SCHEMBL9712164 0.74
SCHEMBL5585332 0.73 LTA4H (0.34) LTA4HTSHRGRIN1GRIN2AGRIN2B
SCHEMBL9712178 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1037112-B1 POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION AND PROCESS FOR PRODUCING THE SAME TORAY INDUSTRIES (JP) 2004-11-24 EP disclosed
US-20040170914-A1 Positive-working photosensitive resin precursor composition TOMIKAWA MASAO (JP) 2004-09-02 US disclosed
US-6723484-B1 POLYAMIDE CAPABLE OF FORMING POLYOXAZOLE OR POLYIMIDE; AND PHOTOACID GENERATOR TORAY INDUSTRIES, INC. (JP) 2004-04-20 US disclosed
EP-1037112-A1 POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION AND PROCESS FOR PRODUCING THE SAME TORAY INDUSTRIES, INC. (JP) 2000-09-20 EP disclosed