SCHEMBL6685764

SCHEMBL6685764

CCCOC1(OCCC)CCCN1C

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.30
OPRD1 P41143 1/20 0.30
OPRK1 P41145 1/20 0.30
OPRL1 P41146 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6762569 0.94
SCHEMBL5585758 0.94
SCHEMBL6684870 0.88 LTA4H (0.33)
SCHEMBL5585718 0.87 OPRM1 (0.32) OPRM1OPRD1OPRK1OPRL1
SCHEMBL5586077 0.83
SCHEMBL5585687 0.80 OPRM1 (0.32) OPRM1OPRD1OPRK1OPRL1
SCHEMBL9712164 0.77
SCHEMBL5585632 0.76 OPRM1 (0.30) OPRM1OPRD1OPRK1OPRL1
SCHEMBL9712178 0.75
SCHEMBL3624068 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1037112-B1 POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION AND PROCESS FOR PRODUCING THE SAME TORAY INDUSTRIES (JP) 2004-11-24 EP disclosed
US-20040170914-A1 Positive-working photosensitive resin precursor composition TOMIKAWA MASAO (JP) 2004-09-02 US disclosed
EP-1037112-A1 POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION AND PROCESS FOR PRODUCING THE SAME TORAY INDUSTRIES, INC. (JP) 2000-09-20 EP disclosed