⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL611428 | 1.00 | — | — | |
| SCHEMBL5858664 | 0.87 | — | — | |
| SCHEMBL9565122 | 0.82 | — | — | |
| SCHEMBL33275 | 0.82 | — | — | |
| SCHEMBL139003 | 0.82 | — | — | |
| SCHEMBL3467470 | 0.82 | — | — | |
| SCHEMBL5434695 | 0.67 | — | — | |
| SCHEMBL4368546 | 0.67 | — | — | |
| SCHEMBL1796527 | 0.67 | — | — | |
| SCHEMBL2539870 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115820127-A | Chemical mechanical polishing solution suitable for copper-cobalt interconnection structure and preparation method thereof | 上海交通大学 | 2023-03-21 | — | — | CN | disclosed |
| CN-112420849-A | Metal oxide thin film transistor and manufacturing method thereof | 昆山龙腾光电股份有限公司 | 2021-02-26 | — | — | CN | disclosed |
| CN-105448925-B | Semiconductor structure and manufacturing method thereof | 旺宏电子股份有限公司 | 2018-06-22 | — | — | CN | disclosed |
| CN-105448925-A | Semiconductor structure and manufacturing method thereof | MACRONIX INT CO LTD | 2016-03-30 | — | — | CN | disclosed |
| US-9299765-B2 | Altering capacitance of MIM capacitor having reactive layer therein | GLOBALFOUNDRIES INC. (KY) | 2016-03-29 | — | — | US | disclosed |
| US-20150221717-A1 | ALTERING CAPACITANCE OF MIM CAPACITOR HAVING REACTIVE LAYER THEREIN | GLOBALFOUNDRIES U.S. INC. | 2015-08-06 | — | — | US | disclosed |
| US-9013857-B2 | Altering capacitance of MIM capacitor having reactive layer therein | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-04-21 | — | — | US | disclosed |
| US-8710478-B2 | Nonvolatile semiconductor storage device and a manufacturing method thereof | RENESAS ELECTRONICS CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20130107416-A1 | ALTERING CAPACITANCE OF MIM CAPACITOR HAVING REACTIVE LAYER THEREIN | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | US | disclosed |
| US-8363379-B2 | Altering capacitance of MIM capacitor having reactive layer therein | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-29 | — | — | US | disclosed |
| US-20030127107-A1 | Apparatus and method for removing coating layers from alignment marks | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. | 2003-07-10 | — | — | US | disclosed |
| US-6541384-B1 | Method of initiating cooper CMP process | APPLIED MATERIALS, INC. | 2003-04-01 | — | — | US | disclosed |
| WO-2003007348-A2 | APPARATUS AND METHOD FOR CONTROLLING GALVANIC CORROSION EFFECTS ON A SINGLE-WAFER CLEANING SYSTEM | LAM RESEARCH CORPORATION (US) | 2003-01-23 | — | — | WO | disclosed |
| US-20030010361-A1 | Apparatus and method for controlling galvanic corrosion effects on a single-wafer cleaning system | LAM RESEARCH CORPORATION | 2003-01-16 | — | — | US | disclosed |
| US-6498386-B2 | Cylindrical semiconductor capacitor | CHARTERED SEMICONDUCTOR MANUFACTURING, INC. | 2002-12-24 | — | — | US | disclosed |
| WO-2002020682-A2 | METHOD OF INITIATING COPPER CMP PROCESS | APPLIED MATERIALS, INC. (US) | 2002-03-14 | — | — | WO | disclosed |
| US-20020024778-A1 | Spin valve films with improved cap layers | SEAGATE TECHNOLOGY LLC | 2002-02-28 | — | — | US | disclosed |
| US-20010026002-A1 | Cylindrical semiconductor capacitor | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 2001-10-04 | — | — | US | disclosed |
| US-6265280-B1 | Method for manufacturing a cylindrical semiconductor capacitor | CHARTERED SEMICONDUCTOR MANUFACTURING, INC. | 2001-07-24 | — | — | US | disclosed |
| US-6265280-B1 | Method for manufacturing a cylindrical semiconductor capacitor | CHARTERED SEMICONDUCTOR MANUFACTURING, INC. | 2001-07-24 | — | — | US | disclosed |